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Article: Formation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions

TitleFormation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions
Authors
Issue Date2-May-2023
PublisherIOP Publishing
Citation
2D Materials, 2023, v. 10, n. 3, p. 1-8 How to Cite?
Abstract

Mirror twin grain boundary (MTB) defects, being a special type of high-symmetry one-dimensional (1D) defects in two-dimensional atomically thin transition metal dichalcogenides (TMDCs), have received considerable interest due to their unique structures and intriguing 1D properties. However, formation and distribution of MTBs in hybrid TMDC materials such as heterojunction remain scarcely studied. Herein, we investigate the spatial distribution, lattice registry and formation mechanism of MTBs in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions using atomic-resolution annular dark-field scanning transmission electron microscopy (ADF-STEM). MTBs manifest a much higher density in MoSe2 than in WSe2 domains with a few of them spanning coherently across the domain interface. Compositionally, a Mo-dominant rather than W-dominant configuration was observed in those MTBs located in WSe2 domains and its origin can be attributed to the preferable Mo substitution to W along the MTBs occurring at the later MoSe2 growth period. This proposed mechanism is supported by ab-initio density functional theory calculations and substitution dynamics captured by in-situ ADF-STEM. The present study deepens our understanding of MTBs in heterostructured TMDCs, which may also serve as an excellent platform for the exploration of intriguing 1D physics.


Persistent Identifierhttp://hdl.handle.net/10722/328489
ISSN
2023 Impact Factor: 4.5
2023 SCImago Journal Rankings: 1.483
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorYu, ZB-
dc.contributor.authorDai, YW-
dc.contributor.authorKomsa, HP-
dc.contributor.authorRen, XB-
dc.contributor.authorYuan, MF-
dc.contributor.authorXie, MH-
dc.contributor.authorJin, CH-
dc.date.accessioned2023-06-28T04:45:25Z-
dc.date.available2023-06-28T04:45:25Z-
dc.date.issued2023-05-02-
dc.identifier.citation2D Materials, 2023, v. 10, n. 3, p. 1-8-
dc.identifier.issn2053-1583-
dc.identifier.urihttp://hdl.handle.net/10722/328489-
dc.description.abstract<p>Mirror twin grain boundary (MTB) defects, being a special type of high-symmetry one-dimensional (1D) defects in two-dimensional atomically thin transition metal dichalcogenides (TMDCs), have received considerable interest due to their unique structures and intriguing 1D properties. However, formation and distribution of MTBs in hybrid TMDC materials such as heterojunction remain scarcely studied. Herein, we investigate the spatial distribution, lattice registry and formation mechanism of MTBs in molecular beam epitaxy grown monolayer WSe<sub>2</sub>–MoSe<sub>2</sub> lateral heterojunctions using atomic-resolution annular dark-field scanning transmission electron microscopy (ADF-STEM). MTBs manifest a much higher density in MoSe<sub>2</sub> than in WSe<sub>2</sub> domains with a few of them spanning coherently across the domain interface. Compositionally, a Mo-dominant rather than W-dominant configuration was observed in those MTBs located in WSe<sub>2</sub> domains and its origin can be attributed to the preferable Mo substitution to W along the MTBs occurring at the later MoSe<sub>2</sub> growth period. This proposed mechanism is supported by <em>ab-initio</em> density functional theory calculations and substitution dynamics captured by <em>in-situ</em> ADF-STEM. The present study deepens our understanding of MTBs in heterostructured TMDCs, which may also serve as an excellent platform for the exploration of intriguing 1D physics.<br></p>-
dc.languageeng-
dc.publisherIOP Publishing-
dc.relation.ispartof2D Materials-
dc.titleFormation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions -
dc.typeArticle-
dc.identifier.doi10.1088/2053-1583/accd06-
dc.identifier.volume10-
dc.identifier.issue3-
dc.identifier.spage1-
dc.identifier.epage8-
dc.identifier.eissn2053-1583-
dc.identifier.isiWOS:000980289400001-
dc.identifier.issnl2053-1583-

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