File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Enhanced CVD approach to extensive nanotube networks with directionality

TitleEnhanced CVD approach to extensive nanotube networks with directionality
Authors
Franklin, Nathan R.Dai, Hongjie
Issue Date2000
Citation
Advanced Materials, 2000, v. 12, n. 12, p. 890-894 How to Cite?
DOI: http://dx.doi.org/10.1002/1521-4095(200006)12:12<890::AID-ADMA890>3.0.CO;2-K
AbstractA chemical vapor deposition (CVD) approach to grow nanotubes on elevated tower structures fabricated on silicon substrates is developed. The growth of single-walled carbon nanotube (SWNT) under this CVD is presented in terms of yield, length, and directionality. Extensive networks of suspended SWNT with a high degree of orientation are obtained.
Persistent Identifierhttp://hdl.handle.net/10722/334054
ISSN
0935-9648
2021 Impact Factor: 32.086
2020 SCImago Journal Rankings: 10.707
ISI Accession Number ID
WOS:000087851400007

 

DC FieldValueLanguage
dc.contributor.authorFranklin, Nathan R.-
dc.contributor.authorDai, Hongjie-
dc.date.accessioned2023-10-20T06:45:19Z-
dc.date.available2023-10-20T06:45:19Z-
dc.date.issued2000-
dc.identifier.citationAdvanced Materials, 2000, v. 12, n. 12, p. 890-894-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10722/334054-
dc.description.abstractA chemical vapor deposition (CVD) approach to grow nanotubes on elevated tower structures fabricated on silicon substrates is developed. The growth of single-walled carbon nanotube (SWNT) under this CVD is presented in terms of yield, length, and directionality. Extensive networks of suspended SWNT with a high degree of orientation are obtained.-
dc.languageeng-
dc.relation.ispartofAdvanced Materials-
dc.titleEnhanced CVD approach to extensive nanotube networks with directionality-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/1521-4095(200006)12:12<890::AID-ADMA890>3.0.CO;2-K-
dc.identifier.scopuseid_2-s2.0-0033707594-
dc.identifier.volume12-
dc.identifier.issue12-
dc.identifier.spage890-
dc.identifier.epage894-
dc.identifier.isiWOS:000087851400007-

Export via OAI-PMH Interface in XML Formats

OR

Export to Other Non-XML Formats