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Article: Capillary force lithography

TitleCapillary force lithography
Authors
Kong, J.Chapline, M. G.Dai, H.
Issue Date2001
Citation
Advanced Materials, 2001, v. 13, n. 18, p. 1386-1389 How to Cite?
DOI: http://dx.doi.org/10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X
AbstractA simple yet robust method for large-area patterning of polymer films, capillary force lithography, is presented. The method, which combines the essential features of imprint lithography and microcontact printing, allows the replication of features down to 100 nm.
Persistent Identifierhttp://hdl.handle.net/10722/334063
ISSN
0935-9648
2023 Impact Factor: 27.4
2023 SCImago Journal Rankings: 9.191
ISI Accession Number ID
WOS:000171156800009

 

DC FieldValueLanguage
dc.contributor.authorKong, J.-
dc.contributor.authorChapline, M. G.-
dc.contributor.authorDai, H.-
dc.date.accessioned2023-10-20T06:45:22Z-
dc.date.available2023-10-20T06:45:22Z-
dc.date.issued2001-
dc.identifier.citationAdvanced Materials, 2001, v. 13, n. 18, p. 1386-1389-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10722/334063-
dc.description.abstractA simple yet robust method for large-area patterning of polymer films, capillary force lithography, is presented. The method, which combines the essential features of imprint lithography and microcontact printing, allows the replication of features down to 100 nm.-
dc.languageeng-
dc.relation.ispartofAdvanced Materials-
dc.titleCapillary force lithography-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X-
dc.identifier.scopuseid_2-s2.0-0035860303-
dc.identifier.volume13-
dc.identifier.issue18-
dc.identifier.spage1386-
dc.identifier.epage1389-
dc.identifier.isiWOS:000171156800009-

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