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Article: Controlled chlorine plasma reaction for noninvasive graphene doping

TitleControlled chlorine plasma reaction for noninvasive graphene doping
Authors
Issue Date2011
Citation
Journal of the American Chemical Society, 2011, v. 133, n. 49, p. 19668-19671 How to Cite?
AbstractWe investigated the chlorine plasma reaction with graphene and graphene nanoribbons and compared it with the hydrogen and fluorine plasma reactions. Unlike the rapid destruction of graphene by hydrogen and fluorine plasmas, much slower reaction kinetics between the chlorine plasma and graphene were observed, allowing for controlled chlorination. Electrical measurements on graphene sheets, graphene nanoribbons, and large graphene films grown by chemical vapor deposition showed p-type doping accompanied by a conductance increase, suggesting nondestructive doping via chlorination. Ab initio simulations were performed to rationalize the differences in fluorine, hydrogen, and chlorine functionalization of graphene. © 2011 American Chemical Society.
Persistent Identifierhttp://hdl.handle.net/10722/334265
ISSN
2023 Impact Factor: 14.4
2023 SCImago Journal Rankings: 5.489
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWu, Justin-
dc.contributor.authorXie, Liming-
dc.contributor.authorLi, Yanguang-
dc.contributor.authorWang, Hailiang-
dc.contributor.authorOuyang, Yijian-
dc.contributor.authorGuo, Jing-
dc.contributor.authorDai, Hongjie-
dc.date.accessioned2023-10-20T06:46:54Z-
dc.date.available2023-10-20T06:46:54Z-
dc.date.issued2011-
dc.identifier.citationJournal of the American Chemical Society, 2011, v. 133, n. 49, p. 19668-19671-
dc.identifier.issn0002-7863-
dc.identifier.urihttp://hdl.handle.net/10722/334265-
dc.description.abstractWe investigated the chlorine plasma reaction with graphene and graphene nanoribbons and compared it with the hydrogen and fluorine plasma reactions. Unlike the rapid destruction of graphene by hydrogen and fluorine plasmas, much slower reaction kinetics between the chlorine plasma and graphene were observed, allowing for controlled chlorination. Electrical measurements on graphene sheets, graphene nanoribbons, and large graphene films grown by chemical vapor deposition showed p-type doping accompanied by a conductance increase, suggesting nondestructive doping via chlorination. Ab initio simulations were performed to rationalize the differences in fluorine, hydrogen, and chlorine functionalization of graphene. © 2011 American Chemical Society.-
dc.languageeng-
dc.relation.ispartofJournal of the American Chemical Society-
dc.titleControlled chlorine plasma reaction for noninvasive graphene doping-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/ja2091068-
dc.identifier.scopuseid_2-s2.0-83055165802-
dc.identifier.volume133-
dc.identifier.issue49-
dc.identifier.spage19668-
dc.identifier.epage19671-
dc.identifier.eissn1520-5126-
dc.identifier.isiWOS:000298719800027-

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