A new scanning probe lithography scheme with a novel metal resist

Abstract

The scope of scanning probe lithography (SPL) as a technique for nanofabrication at the nanometer resolution level was discussed. The technique was used for patterning of silicon using Mo as a metal resist. Atomic force microscopy was used for image analysis due to its simplicity, lower requirements and ability for high-resolution real-space imaging. The use of water as chemical etchant made the process compatible with biological systems. The strategy can be used for nanoscale patterning of biological molecules.