Effect of substrate temperature on crystallization behavior of NiTi thin films

Abstract

NiTi thin films were deposited on hot substrate by D.C. magnetron sputtering at substrate temperatures of 350°C, 370°C and 420°C, respectively, the interfacial characteristics and the size of the crystalline particles in NiTi thin films were studied using X-ray diffraction (XRD) and small-angle X-ray scattering (SAXS), and the results show that the crystallization temperature is reduced, and the films deposited on substrates above 350°C are party crystallized; the sizes of crystalline particles obtained are 2.40 nm, 2.59 nm and 2.81 nm for substrate temperatures of 350°C, 370°C and 420°C, respectively; and the crystalline particles of NiTi film deposited on heated substrate have a sharp interface between crystallized and amorphous phases.