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Article: Advancing High-Performance Memristors Enabled by Position-Controlled Grain Boundaries in Controllably Grown Star-Shaped MoS2

TitleAdvancing High-Performance Memristors Enabled by Position-Controlled Grain Boundaries in Controllably Grown Star-Shaped MoS2
Authors
Keywordschemical vapor deposition (CVD)
controllable synthesis strategy
grain boundaries (GBs)
memristors
transition metal dichalcogenides (TMDs)
Issue Date22-Nov-2024
PublisherAmerican Chemical Society
Citation
Nano Letters, 2024, v. 24, n. 48, p. 15388-15395 How to Cite?
Abstract

Two-dimensional transition metal dichalcogenides are highly promising platforms for memristive switching devices that seamlessly integrate computation and memory. Grain boundaries (GBs), an important micro-nanoscale structure, hold tremendous potential in memristors, but their role remains unclear due to their random distribution, which hinders fabrication. Herein, we present a novel chemical vapor deposition approach to synthesize star-shaped MoS2 nanoflakes with precisely positioned GBs. This approach enables memristor fabrication at specific locations and notably reduces the average set voltage (16-fold reduction) compared to single-crystalline MoS2, due to reduced diffusion barriers for metallic ions through GBs, as further validated by theoretical calculations. These findings offer a new method for synthesizing TMDs with controlled GBs for memristor fabrication, highlighting the crucial role of GBs in reducing set voltage and power consumption, advancing memristive switching devices toward applications in integrated computation and memory systems.


Persistent Identifierhttp://hdl.handle.net/10722/355143
ISSN
2023 Impact Factor: 9.6
2023 SCImago Journal Rankings: 3.411

 

DC FieldValueLanguage
dc.contributor.authorLan, Shangui-
dc.contributor.authorZheng, Fangyuan-
dc.contributor.authorDing, Changchun-
dc.contributor.authorHong, Yukun-
dc.contributor.authorWang, Baoyu-
dc.contributor.authorLi, Chenyang-
dc.contributor.authorLi, Shuqing-
dc.contributor.authorYang, Hong-
dc.contributor.authorHu, Zhili-
dc.contributor.authorPan, Baojun-
dc.contributor.authorChai, Jian-
dc.contributor.authorWang, Yinan-
dc.contributor.authorHuang, Guiqing-
dc.contributor.authorYue, Min-
dc.contributor.authorWang, Shun-
dc.contributor.authorLi, Lain Jong-
dc.contributor.authorZhang, Lijie-
dc.contributor.authorWang, Peijian-
dc.date.accessioned2025-03-28T00:35:26Z-
dc.date.available2025-03-28T00:35:26Z-
dc.date.issued2024-11-22-
dc.identifier.citationNano Letters, 2024, v. 24, n. 48, p. 15388-15395-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10722/355143-
dc.description.abstract<p>Two-dimensional transition metal dichalcogenides are highly promising platforms for memristive switching devices that seamlessly integrate computation and memory. Grain boundaries (GBs), an important micro-nanoscale structure, hold tremendous potential in memristors, but their role remains unclear due to their random distribution, which hinders fabrication. Herein, we present a novel chemical vapor deposition approach to synthesize star-shaped MoS2 nanoflakes with precisely positioned GBs. This approach enables memristor fabrication at specific locations and notably reduces the average set voltage (16-fold reduction) compared to single-crystalline MoS2, due to reduced diffusion barriers for metallic ions through GBs, as further validated by theoretical calculations. These findings offer a new method for synthesizing TMDs with controlled GBs for memristor fabrication, highlighting the crucial role of GBs in reducing set voltage and power consumption, advancing memristive switching devices toward applications in integrated computation and memory systems.</p>-
dc.languageeng-
dc.publisherAmerican Chemical Society-
dc.relation.ispartofNano Letters-
dc.subjectchemical vapor deposition (CVD)-
dc.subjectcontrollable synthesis strategy-
dc.subjectgrain boundaries (GBs)-
dc.subjectmemristors-
dc.subjecttransition metal dichalcogenides (TMDs)-
dc.titleAdvancing High-Performance Memristors Enabled by Position-Controlled Grain Boundaries in Controllably Grown Star-Shaped MoS2-
dc.typeArticle-
dc.identifier.doi10.1021/acs.nanolett.4c04642-
dc.identifier.pmid39575932-
dc.identifier.scopuseid_2-s2.0-85209988196-
dc.identifier.volume24-
dc.identifier.issue48-
dc.identifier.spage15388-
dc.identifier.epage15395-
dc.identifier.eissn1530-6992-
dc.identifier.issnl1530-6984-

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