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Article: A deep level transient spectroscopy study of electron irradiation induced deep levels in p-type 6H–SiC
Title | A deep level transient spectroscopy study of electron irradiation induced deep levels in p-type 6H–SiC |
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Authors | |
Keywords | Physics engineering |
Issue Date | 1999 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 1999, v. 85 n. 10, p. 7120-7122 How to Cite? |
Abstract | 1.7 MeV electron irradiation-induced deep levels in p-type 6H–SiC have been studied using deep level transient spectroscopy. Two deep hole traps are observed, which are located at EV+0.55 eV and EV+0.78 eV. They have been identified as two different defects because they have different thermal behaviors. These defects at EV+0.55 eV and EV+0.78 eV are annealed out at 500–200 °C, respectively, and are different from the main defects E1/E2, Z1/Z2 observed in electron irradiated n-type 6H–SiC. This indicates that new defects have been formed in p-type 6H–SiC during electron irradiation. ©1999 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/42189 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Gong, M | en_HK |
dc.contributor.author | Fung, SHY | en_HK |
dc.contributor.author | Beling, CD | en_HK |
dc.contributor.author | You, Z | en_HK |
dc.date.accessioned | 2007-01-08T02:31:17Z | - |
dc.date.available | 2007-01-08T02:31:17Z | - |
dc.date.issued | 1999 | en_HK |
dc.identifier.citation | Journal of Applied Physics, 1999, v. 85 n. 10, p. 7120-7122 | - |
dc.identifier.issn | 0021-8979 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/42189 | - |
dc.description.abstract | 1.7 MeV electron irradiation-induced deep levels in p-type 6H–SiC have been studied using deep level transient spectroscopy. Two deep hole traps are observed, which are located at EV+0.55 eV and EV+0.78 eV. They have been identified as two different defects because they have different thermal behaviors. These defects at EV+0.55 eV and EV+0.78 eV are annealed out at 500–200 °C, respectively, and are different from the main defects E1/E2, Z1/Z2 observed in electron irradiated n-type 6H–SiC. This indicates that new defects have been formed in p-type 6H–SiC during electron irradiation. ©1999 American Institute of Physics. | en_HK |
dc.format.extent | 55113 bytes | - |
dc.format.extent | 9781 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_HK |
dc.relation.ispartof | Journal of Applied Physics | - |
dc.rights | Copyright 1999 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics, 1999, v. 85 n. 10, p. 7120-7122 and may be found at https://doi.org/10.1063/1.370520 | - |
dc.subject | Physics engineering | en_HK |
dc.title | A deep level transient spectroscopy study of electron irradiation induced deep levels in p-type 6H–SiC | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-8979&volume=85&issue=10&spage=7120&epage=7122&date=1999&atitle=A+deep+level+transient+spectroscopy+study+of+electron+irradiation+induced+deep+levels+in+p-type+6H–SiC | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1063/1.370520 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0000206203 | - |
dc.identifier.hkuros | 40644 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0000206203&selection=ref&src=s&origin=recordpage | - |
dc.identifier.volume | 85 | - |
dc.identifier.issue | 10 | - |
dc.identifier.spage | 7120 | - |
dc.identifier.epage | 7122 | - |
dc.identifier.isi | WOS:000080136000016 | - |
dc.publisher.place | United States | - |
dc.identifier.scopusauthorid | Gong, M=9273057400 | - |
dc.identifier.scopusauthorid | Fung, S=7201970040 | - |
dc.identifier.scopusauthorid | Beling, CD=7005864180 | - |
dc.identifier.scopusauthorid | You, Z=7102207882 | - |
dc.identifier.issnl | 0021-8979 | - |