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Article: Photoinduced Dehydrogenation of Defects in Undoped a-Si:H Using Positron Annihilation Spectroscopy
Title | Photoinduced Dehydrogenation of Defects in Undoped a-Si:H Using Positron Annihilation Spectroscopy |
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Authors | |
Keywords | Physics |
Issue Date | 2000 |
Publisher | American Physical Society. The Journal's web site is located at http://prl.aps.org |
Citation | Physical Review Letters, 2000, v. 84 n. 4, p. 769-772 How to Cite? |
Abstract | We report changes in variable-energy positron annihilation spectroscopy measurements on undoped hydrogenated amorphous silicon films after light soaking. The change, seen predominantly in the high momentum band of the annihilation radiation, is not reversed by thermal annealing. We suggest, following recent models of the Staebler-Wronski effect, that light exposure induces hydrogen trapped in vacancylikc detects to become mobile in the Si network. The observations place constraints on models of hydrogen motion fitting macroscopic Staebler-Wronski effect kinetics and may help to achieve a definitive description of metastability in a-Si:H. |
Persistent Identifier | http://hdl.handle.net/10722/42194 |
ISSN | 2023 Impact Factor: 8.1 2023 SCImago Journal Rankings: 3.040 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zou, X | en_HK |
dc.contributor.author | Chan, YC | en_HK |
dc.contributor.author | Webb, DP | en_HK |
dc.contributor.author | Lam, YW | en_HK |
dc.contributor.author | Hu, YF | en_HK |
dc.contributor.author | Beling, CD | en_HK |
dc.contributor.author | Fung, S | en_HK |
dc.contributor.author | Weng, HM | en_HK |
dc.date.accessioned | 2007-01-08T02:31:23Z | - |
dc.date.available | 2007-01-08T02:31:23Z | - |
dc.date.issued | 2000 | en_HK |
dc.identifier.citation | Physical Review Letters, 2000, v. 84 n. 4, p. 769-772 | en_HK |
dc.identifier.issn | 0031-9007 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/42194 | - |
dc.description.abstract | We report changes in variable-energy positron annihilation spectroscopy measurements on undoped hydrogenated amorphous silicon films after light soaking. The change, seen predominantly in the high momentum band of the annihilation radiation, is not reversed by thermal annealing. We suggest, following recent models of the Staebler-Wronski effect, that light exposure induces hydrogen trapped in vacancylikc detects to become mobile in the Si network. The observations place constraints on models of hydrogen motion fitting macroscopic Staebler-Wronski effect kinetics and may help to achieve a definitive description of metastability in a-Si:H. | en_HK |
dc.format.extent | 73703 bytes | - |
dc.format.extent | 9781 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | American Physical Society. The Journal's web site is located at http://prl.aps.org | en_HK |
dc.relation.ispartof | Physical Review Letters | en_HK |
dc.rights | Copyright 2000 by The American Physical Society. This article is available online at https://doi.org/10.1103/PhysRevLett.84.769 | - |
dc.subject | Physics | en_HK |
dc.title | Photoinduced Dehydrogenation of Defects in Undoped a-Si:H Using Positron Annihilation Spectroscopy | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0031-9007&volume=84&issue=4&spage=769&epage=772&date=2000&atitle=Photoinduced+dehydrogenation+of+defects+in+undoped+a-Si:H+using+positron+annihilation+spectroscopy | en_HK |
dc.identifier.email | Beling, CD: cdbeling@hkucc.hku.hk | en_HK |
dc.identifier.email | Fung, S: sfung@hku.hk | en_HK |
dc.identifier.authority | Beling, CD=rp00660 | en_HK |
dc.identifier.authority | Fung, S=rp00695 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1103/PhysRevLett.84.769 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0000224753 | en_HK |
dc.identifier.hkuros | 47811 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0000224753&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 84 | en_HK |
dc.identifier.issue | 4 | en_HK |
dc.identifier.spage | 769 | en_HK |
dc.identifier.epage | 772 | en_HK |
dc.identifier.isi | WOS:000084891700048 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Zou, X=18234346500 | en_HK |
dc.identifier.scopusauthorid | Chan, YC=7403676038 | en_HK |
dc.identifier.scopusauthorid | Webb, DP=7401528584 | en_HK |
dc.identifier.scopusauthorid | Lam, YW=7202563950 | en_HK |
dc.identifier.scopusauthorid | Hu, YF=7407119615 | en_HK |
dc.identifier.scopusauthorid | Beling, CD=7005864180 | en_HK |
dc.identifier.scopusauthorid | Fung, S=7201970040 | en_HK |
dc.identifier.scopusauthorid | Weng, HM=7102468725 | en_HK |
dc.identifier.issnl | 0031-9007 | - |