File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Perpendicular domains in poly(styrene-b-methyl methacrylate) block copolymer films on preferential surfaces

TitlePerpendicular domains in poly(styrene-b-methyl methacrylate) block copolymer films on preferential surfaces
Authors
Wang, HDjurišić, ABXie, MHChan, WKKutsay, O
KeywordsBlock copolymers
Issue Date2005
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2005, v. 488 n. 1-2, p. 329-336 How to Cite?
DOI: http://dx.doi.org/10.1016/j.tsf.2005.04.066
AbstractThe morphology of poly(styrene-block-methyl methacrylate) films was studied as a function of film thickness by atomic force microscopy and field emission scanning electron microscopy. The obtained morphologies were strongly dependent on the film thickness. Five different thickness regimes could be identified. Perpendicular polymethyl methacrylate cylindrical domains were obtained on Si/native oxide substrates without applying external electric field or surface treatments (hydrogen passivation, functionalized random copolymers, or self-assembled monolayers). The orientation of the domains formed by microphase separation was verified by pattern-transfer using reactive ion etching. © 2005 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/69972
ISSN
0040-6090
2021 Impact Factor: 2.358
2020 SCImago Journal Rankings: 0.544
ISI Accession Number ID
WOS:000231435300051
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorWang, Hen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorXie, MHen_HK
dc.contributor.authorChan, WKen_HK
dc.contributor.authorKutsay, Oen_HK
dc.date.accessioned2010-09-06T06:18:32Z-
dc.date.available2010-09-06T06:18:32Z-
dc.date.issued2005en_HK
dc.identifier.citationThin Solid Films, 2005, v. 488 n. 1-2, p. 329-336en_HK
dc.identifier.issn0040-6090en_HK
dc.identifier.urihttp://hdl.handle.net/10722/69972-
dc.description.abstractThe morphology of poly(styrene-block-methyl methacrylate) films was studied as a function of film thickness by atomic force microscopy and field emission scanning electron microscopy. The obtained morphologies were strongly dependent on the film thickness. Five different thickness regimes could be identified. Perpendicular polymethyl methacrylate cylindrical domains were obtained on Si/native oxide substrates without applying external electric field or surface treatments (hydrogen passivation, functionalized random copolymers, or self-assembled monolayers). The orientation of the domains formed by microphase separation was verified by pattern-transfer using reactive ion etching. © 2005 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_HK
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsfen_HK
dc.relation.ispartofThin Solid Filmsen_HK
dc.subjectBlock copolymersen_HK
dc.titlePerpendicular domains in poly(styrene-b-methyl methacrylate) block copolymer films on preferential surfacesen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0040-6090&volume=488&spage=329&epage=336&date=2005&atitle=Perpendicular+domains+in+poly(styrene-b-methyl+methacrylate)+block+copolymer+films+on+preferential+surfacesen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailXie, MH: mhxie@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityXie, MH=rp00818en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.tsf.2005.04.066en_HK
dc.identifier.scopuseid_2-s2.0-23044508914en_HK
dc.identifier.hkuros99066en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-23044508914&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume488en_HK
dc.identifier.issue1-2en_HK
dc.identifier.spage329en_HK
dc.identifier.epage336en_HK
dc.identifier.isiWOS:000231435300051-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridWang, H=8694347500en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridXie, MH=7202255416en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.scopusauthoridKutsay, O=6506469949en_HK
dc.identifier.issnl0040-6090-

Export via OAI-PMH Interface in XML Formats

OR

Export to Other Non-XML Formats