Showing results 1 to 3 of 3
Title | Author(s) | Issue Date | |
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2020 | |||
Machine learning for inverse lithography: Using stochastic gradient descent for robust photomask synthesis Journal:Journal of Optics A: Pure and Applied Optics | 2010 | ||
Robust mask design with defocus variation using inverse synthesis Proceeding/Conference:Proceedings of SPIE | 2008 |