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Article: Comparison of pulse activation vs conventional light-curing on marginal adaptation of a compomer conditioned using a total-etch or a self-etch technique
Title | Comparison of pulse activation vs conventional light-curing on marginal adaptation of a compomer conditioned using a total-etch or a self-etch technique |
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Authors | |
Keywords | Dental Material Light-Curing Technique Marginal Quality Restoration |
Issue Date | 2002 |
Publisher | Elsevier Inc. The Journal's web site is located at http://www.elsevier.com/locate/dental |
Citation | Dental Materials, 2002, v. 18 n. 1, p. 36-48 How to Cite? |
Abstract | Objectives: This study investigated the effect of two factors: conditioning methods and light-curing techniques on the marginal adaptation of Dyract AP (Dentsply DeTrey, Germany). The 'pulse activation' curing technique was compared with a conventional light-curing technique for their effectiveness in reducing marginal gaps in restorations that were conditioned with three different protocols. Materials and methods: Cylindrical cavities, 3mm in diameter, were prepared in extracted human molar teeth. They were restored with Dyract AP using Prime&Bond NT (PBNT; Dentsply DeTrey) as the adhesive. Cavities were etched with: Conditioner36/PBNT (group 1), Non-Rinse Conditioner (NRC)/PBNT (group 2), and PBNT only (group 3). Either conventional or the 'pulse activation' technique was used for light-curing of the material. Epoxy resin replicas were obtained from longitudinal sections of the specimens, and the restoration-tooth interfaces were examined using scanning electron microscopy. Marginal qualities along the resin-dentin interfaces were further measured using image analysis and analyzed using nonparametric statistical methods. Results: With the conventional curing technique, enamel margin fractures were frequently observed. Marginal gaps were found along the compomer-dentin interfaces irrespective of the conditioning protocol. A significantly lower percentage of gap-containing margins were found in cavities that were conditioned with 36% phosphoric acid. With the 'pulse activation' technique, no marginal gap was found along compomer-dentin interfaces that were etched with either Conditioner36 or NRC. More than 90% of the total margin length were excellent. No cohesive failure of enamel could be observed along cavosurface margins. Significance: The 'pulse activation' curing technique significantly improves the marginal integrity of Dyract AP when Conditioner36/Prime&Bond NT and NRC/Prime&Bond NT are used as conditioning/bonding systems. The use of Prime&Bond NT without etching is not recommended, as marginal gaps are present irrespective of the curing techniques employed. © 2002 Academy of Dental Materials. Published by Elsevier Science Ltd. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/154182 |
ISSN | 2023 Impact Factor: 4.6 2023 SCImago Journal Rankings: 1.186 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Luo, Y | en_US |
dc.contributor.author | Lo, ECM | en_US |
dc.contributor.author | Wei, SHY | en_US |
dc.contributor.author | Tay, FR | en_US |
dc.date.accessioned | 2012-08-08T08:23:45Z | - |
dc.date.available | 2012-08-08T08:23:45Z | - |
dc.date.issued | 2002 | en_US |
dc.identifier.citation | Dental Materials, 2002, v. 18 n. 1, p. 36-48 | en_US |
dc.identifier.issn | 0109-5641 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/154182 | - |
dc.description.abstract | Objectives: This study investigated the effect of two factors: conditioning methods and light-curing techniques on the marginal adaptation of Dyract AP (Dentsply DeTrey, Germany). The 'pulse activation' curing technique was compared with a conventional light-curing technique for their effectiveness in reducing marginal gaps in restorations that were conditioned with three different protocols. Materials and methods: Cylindrical cavities, 3mm in diameter, were prepared in extracted human molar teeth. They were restored with Dyract AP using Prime&Bond NT (PBNT; Dentsply DeTrey) as the adhesive. Cavities were etched with: Conditioner36/PBNT (group 1), Non-Rinse Conditioner (NRC)/PBNT (group 2), and PBNT only (group 3). Either conventional or the 'pulse activation' technique was used for light-curing of the material. Epoxy resin replicas were obtained from longitudinal sections of the specimens, and the restoration-tooth interfaces were examined using scanning electron microscopy. Marginal qualities along the resin-dentin interfaces were further measured using image analysis and analyzed using nonparametric statistical methods. Results: With the conventional curing technique, enamel margin fractures were frequently observed. Marginal gaps were found along the compomer-dentin interfaces irrespective of the conditioning protocol. A significantly lower percentage of gap-containing margins were found in cavities that were conditioned with 36% phosphoric acid. With the 'pulse activation' technique, no marginal gap was found along compomer-dentin interfaces that were etched with either Conditioner36 or NRC. More than 90% of the total margin length were excellent. No cohesive failure of enamel could be observed along cavosurface margins. Significance: The 'pulse activation' curing technique significantly improves the marginal integrity of Dyract AP when Conditioner36/Prime&Bond NT and NRC/Prime&Bond NT are used as conditioning/bonding systems. The use of Prime&Bond NT without etching is not recommended, as marginal gaps are present irrespective of the curing techniques employed. © 2002 Academy of Dental Materials. Published by Elsevier Science Ltd. All rights reserved. | en_US |
dc.language | eng | en_US |
dc.publisher | Elsevier Inc. The Journal's web site is located at http://www.elsevier.com/locate/dental | en_US |
dc.relation.ispartof | Dental Materials | en_US |
dc.subject | Dental Material | en_US |
dc.subject | Light-Curing Technique | en_US |
dc.subject | Marginal Quality | en_US |
dc.subject | Restoration | en_US |
dc.title | Comparison of pulse activation vs conventional light-curing on marginal adaptation of a compomer conditioned using a total-etch or a self-etch technique | en_US |
dc.type | Article | en_US |
dc.identifier.email | Lo, ECM:hrdplcm@hkucc.hku.hk | en_US |
dc.identifier.authority | Lo, ECM=rp00015 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1016/S0109-5641(01)00018-5 | en_US |
dc.identifier.scopus | eid_2-s2.0-0036134584 | en_US |
dc.identifier.hkuros | 68616 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0036134584&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 18 | en_US |
dc.identifier.issue | 1 | en_US |
dc.identifier.spage | 36 | en_US |
dc.identifier.epage | 48 | en_US |
dc.identifier.isi | WOS:000173318300005 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Luo, Y=49161174100 | en_US |
dc.identifier.scopusauthorid | Lo, ECM=7101705982 | en_US |
dc.identifier.scopusauthorid | Wei, SHY=7401765260 | en_US |
dc.identifier.scopusauthorid | Tay, FR=7102091962 | en_US |
dc.identifier.issnl | 0109-5641 | - |