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Article: Tunable Interaction-Induced Localization of Surface Electrons in Antidot Nanostructured Bi2Te3 Thin Films

TitleTunable Interaction-Induced Localization of Surface Electrons in Antidot Nanostructured Bi2Te3 Thin Films
Authors
Liu, HCLu, HHe, HTLi, BKLiu, SGHe, QLWang, GSou, IKShen, SWang, JN
Keywordsantidot
electron-electron interaction
surface states
topological insulator
weak antilocalization effect
Issue Date2014
PublisherAmerican Chemical Society.
Citation
ACS Nano, 2014, v. 8 n. 9, p. 9616-9621 How to Cite?
DOI: http://dx.doi.org/10.1021/nn504014e
Persistent Identifierhttp://hdl.handle.net/10722/206812
ISSN
1936-0851
2021 Impact Factor: 18.027
2020 SCImago Journal Rankings: 5.554
ISI Accession Number ID
WOS:000342184400095

 

DC FieldValueLanguage
dc.contributor.authorLiu, HCen_US
dc.contributor.authorLu, Hen_US
dc.contributor.authorHe, HTen_US
dc.contributor.authorLi, BKen_US
dc.contributor.authorLiu, SGen_US
dc.contributor.authorHe, QLen_US
dc.contributor.authorWang, Gen_US
dc.contributor.authorSou, IKen_US
dc.contributor.authorShen, Sen_US
dc.contributor.authorWang, JNen_US
dc.date.accessioned2014-12-02T09:36:58Z-
dc.date.available2014-12-02T09:36:58Z-
dc.date.issued2014en_US
dc.identifier.citationACS Nano, 2014, v. 8 n. 9, p. 9616-9621en_US
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10722/206812-
dc.languageengen_US
dc.publisherAmerican Chemical Society.en_US
dc.relation.ispartofACS Nanoen_US
dc.subjectantidot-
dc.subjectelectron-electron interaction-
dc.subjectsurface states-
dc.subjecttopological insulator-
dc.subjectweak antilocalization effect-
dc.titleTunable Interaction-Induced Localization of Surface Electrons in Antidot Nanostructured Bi2Te3 Thin Filmsen_US
dc.typeArticleen_US
dc.identifier.emailLu, H: luhz@hku.hken_US
dc.identifier.emailShen, S: sshen@hkucc.hku.hken_US
dc.identifier.authorityLu, H=rp01599en_US
dc.identifier.authorityShen, S=rp00775en_US
dc.identifier.doi10.1021/nn504014een_US
dc.identifier.scopuseid_2-s2.0-84925359113-
dc.identifier.hkuros241678en_US
dc.identifier.volume8en_US
dc.identifier.spage9616en_US
dc.identifier.epage9621en_US
dc.identifier.eissn1936-086X-
dc.identifier.isiWOS:000342184400095-
dc.identifier.issnl1936-0851-

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