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Conference Paper: Computational techniques to incorporate shot count reduction into inverse lithography
Title | Computational techniques to incorporate shot count reduction into inverse lithography |
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Authors | |
Issue Date | 2015 |
Citation | The China Semiconductor Technology International Conference (CSTIC 2015) in conjunction with SEMICON China 2015, Shanghai, China, 15-16 March 2015. How to Cite? |
Description | Symposium II: Lithography and Patterning - SEMICON China |
Persistent Identifier | http://hdl.handle.net/10722/211415 |
DC Field | Value | Language |
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dc.contributor.author | Wu, X | - |
dc.contributor.author | Lam, EYM | - |
dc.contributor.author | Liu, S | - |
dc.date.accessioned | 2015-07-13T02:22:11Z | - |
dc.date.available | 2015-07-13T02:22:11Z | - |
dc.date.issued | 2015 | - |
dc.identifier.citation | The China Semiconductor Technology International Conference (CSTIC 2015) in conjunction with SEMICON China 2015, Shanghai, China, 15-16 March 2015. | - |
dc.identifier.uri | http://hdl.handle.net/10722/211415 | - |
dc.description | Symposium II: Lithography and Patterning - SEMICON China | - |
dc.language | eng | - |
dc.relation.ispartof | China Semiconductor Technology International Conference, CSTIC 2015 | - |
dc.relation.ispartof | 中国国际半导体技术大会(CSTIC) 2015 | - |
dc.title | Computational techniques to incorporate shot count reduction into inverse lithography | - |
dc.type | Conference_Paper | - |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | - |
dc.identifier.authority | Lam, EYM=rp00131 | - |
dc.identifier.hkuros | 245310 | - |