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- Publisher Website: 10.1109/TNANO.2015.2451134
- Scopus: eid_2-s2.0-84960498451
- WOS: WOS:000364504200011
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Article: Influences of Remote Coulomb and Interface-Roughness Scatterings on Electron Mobility of InGaAs n MOSFET With High-k Stacked Gate Dielectric
Title | Influences of Remote Coulomb and Interface-Roughness Scatterings on Electron Mobility of InGaAs <italic> n</italic>MOSFET With High-<italic>k</italic> Stacked Gate Dielectric |
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Authors | |
Keywords | effective electron mobility high-k dielectric InGaAs MOSFETs remote Coulomb scattering remote interfaceroughness scattering |
Issue Date | 2015 |
Publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=7729 |
Citation | IEEE Transactions on Nanotechnology, 2015, v. 14 n. 5, p. 854-861 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/234053 |
ISSN | 2021 Impact Factor: 2.967 2020 SCImago Journal Rankings: 0.574 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Wang, L | - |
dc.contributor.author | Xu, J | - |
dc.contributor.author | Liu, L | - |
dc.contributor.author | Huang, Y | - |
dc.contributor.author | Lu, H | - |
dc.contributor.author | Lai, PT | - |
dc.contributor.author | Tang, WM | - |
dc.date.accessioned | 2016-10-14T06:58:45Z | - |
dc.date.available | 2016-10-14T06:58:45Z | - |
dc.date.issued | 2015 | - |
dc.identifier.citation | IEEE Transactions on Nanotechnology, 2015, v. 14 n. 5, p. 854-861 | - |
dc.identifier.issn | 1536-125X | - |
dc.identifier.uri | http://hdl.handle.net/10722/234053 | - |
dc.language | eng | - |
dc.publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=7729 | - |
dc.relation.ispartof | IEEE Transactions on Nanotechnology | - |
dc.rights | IEEE Transactions on Nanotechnology. Copyright © IEEE. | - |
dc.rights | ©2015 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. | - |
dc.subject | effective electron mobility | - |
dc.subject | high-k dielectric | - |
dc.subject | InGaAs MOSFETs | - |
dc.subject | remote Coulomb scattering | - |
dc.subject | remote interfaceroughness scattering | - |
dc.title | Influences of Remote Coulomb and Interface-Roughness Scatterings on Electron Mobility of InGaAs <italic> n</italic>MOSFET With High-<italic>k</italic> Stacked Gate Dielectric | - |
dc.type | Article | - |
dc.identifier.email | Lai, PT: laip@eee.hku.hk | - |
dc.identifier.authority | Xu, J=rp00197 | - |
dc.identifier.authority | Lai, PT=rp00130 | - |
dc.identifier.doi | 10.1109/TNANO.2015.2451134 | - |
dc.identifier.scopus | eid_2-s2.0-84960498451 | - |
dc.identifier.hkuros | 267823 | - |
dc.identifier.volume | 14 | - |
dc.identifier.issue | 5 | - |
dc.identifier.spage | 854 | - |
dc.identifier.epage | 861 | - |
dc.identifier.isi | WOS:000364504200011 | - |
dc.publisher.place | United States | - |
dc.identifier.issnl | 1536-125X | - |