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Article: Design, fabrication and characterization of a Far-field Superlens
Title | Design, fabrication and characterization of a Far-field Superlens |
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Authors | |
Keywords | D. Optical properties B. Nanofabrications A. Nanostructures |
Issue Date | 2008 |
Citation | Solid State Communications, 2008, v. 146, n. 5-6, p. 202-207 How to Cite? |
Abstract | The fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography. © 2008 Elsevier Ltd. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/256962 |
ISSN | 2023 Impact Factor: 2.1 2023 SCImago Journal Rankings: 0.414 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Lee, Hyesog | - |
dc.contributor.author | Liu, Zhaowei | - |
dc.contributor.author | Xiong, Yi | - |
dc.contributor.author | Sun, Cheng | - |
dc.contributor.author | Zhang, Xiang | - |
dc.date.accessioned | 2018-07-24T08:58:27Z | - |
dc.date.available | 2018-07-24T08:58:27Z | - |
dc.date.issued | 2008 | - |
dc.identifier.citation | Solid State Communications, 2008, v. 146, n. 5-6, p. 202-207 | - |
dc.identifier.issn | 0038-1098 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256962 | - |
dc.description.abstract | The fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography. © 2008 Elsevier Ltd. All rights reserved. | - |
dc.language | eng | - |
dc.relation.ispartof | Solid State Communications | - |
dc.subject | D. Optical properties | - |
dc.subject | B. Nanofabrications | - |
dc.subject | A. Nanostructures | - |
dc.title | Design, fabrication and characterization of a Far-field Superlens | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.ssc.2007.10.043 | - |
dc.identifier.scopus | eid_2-s2.0-41249087199 | - |
dc.identifier.volume | 146 | - |
dc.identifier.issue | 5-6 | - |
dc.identifier.spage | 202 | - |
dc.identifier.epage | 207 | - |
dc.identifier.isi | WOS:000255916100003 | - |
dc.identifier.issnl | 0038-1098 | - |