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Article: Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

TitleGraphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
Authors
Lin, Meng YuSheng, Yung ShuanChen, Shu HanSu, Ching YuanLi, Lain JongLin, Shih Yen
Issue Date2011
Citation
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 6, article no. 061202 How to Cite?
DOI: http://dx.doi.org/10.1116/1.3646481
AbstractAn alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 10 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. © 2011 American Vacuum Society. 4
Persistent Identifierhttp://hdl.handle.net/10722/298546
ISSN
2166-2746
2021 Impact Factor: 1.572
2020 SCImago Journal Rankings: 0.429
ISI Accession Number ID
WOS:000298538800106

 

DC FieldValueLanguage
dc.contributor.authorLin, Meng Yu-
dc.contributor.authorSheng, Yung Shuan-
dc.contributor.authorChen, Shu Han-
dc.contributor.authorSu, Ching Yuan-
dc.contributor.authorLi, Lain Jong-
dc.contributor.authorLin, Shih Yen-
dc.date.accessioned2021-04-08T03:08:44Z-
dc.date.available2021-04-08T03:08:44Z-
dc.date.issued2011-
dc.identifier.citationJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 6, article no. 061202-
dc.identifier.issn2166-2746-
dc.identifier.urihttp://hdl.handle.net/10722/298546-
dc.description.abstractAn alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 10 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. © 2011 American Vacuum Society. 4-
dc.languageeng-
dc.relation.ispartofJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics-
dc.titleGraphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1116/1.3646481-
dc.identifier.scopuseid_2-s2.0-84255190047-
dc.identifier.volume29-
dc.identifier.issue6-
dc.identifier.spagearticle no. 061202-
dc.identifier.epagearticle no. 061202-
dc.identifier.eissn2166-2754-
dc.identifier.isiWOS:000298538800106-
dc.identifier.issnl2166-2746-

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