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Article: Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

TitleSpatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure
Authors
Gan, ZSun, HChen, LMin, SLiang, CXu, MJiang, ZSun, ZSun, CCui, D
Issue Date2022
Citation
Light: Science & Applications, 2022, v. 11 n. 1, p. 1-10 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/322268

 

DC FieldValueLanguage
dc.contributor.authorGan, Z-
dc.contributor.authorSun, H-
dc.contributor.authorChen, L-
dc.contributor.authorMin, S-
dc.contributor.authorLiang, C-
dc.contributor.authorXu, M-
dc.contributor.authorJiang, Z-
dc.contributor.authorSun, Z-
dc.contributor.authorSun, C-
dc.contributor.authorCui, D-
dc.date.accessioned2022-11-14T08:18:31Z-
dc.date.available2022-11-14T08:18:31Z-
dc.date.issued2022-
dc.identifier.citationLight: Science & Applications, 2022, v. 11 n. 1, p. 1-10-
dc.identifier.urihttp://hdl.handle.net/10722/322268-
dc.languageeng-
dc.relation.ispartofLight: Science & Applications-
dc.titleSpatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure-
dc.typeArticle-
dc.identifier.hkuros341842-
dc.identifier.volume11-
dc.identifier.issue1-
dc.identifier.spage1-
dc.identifier.epage10-

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