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Article: Talent development, work habits, and career exploration of Chinese middle-school adolescents: Development of the career and talent development self-efficacy scale

TitleTalent development, work habits, and career exploration of Chinese middle-school adolescents: Development of the career and talent development self-efficacy scale
Authors
KeywordsAdolescents
Assessment
Career development
Chinese
Individual plan
Life skills
Middle school
Self-efficacy
Talent development
Work habits
Issue Date2010
PublisherRoutledge. The Journal's web site is located at http://www.tandf.co.uk/journals/titles/13598139.asp
Citation
High Ability Studies, 2010, v. 21 n. 1, p. 47-62 How to Cite?
AbstractThis article describes the development of an instrument - the Career and Talent Development Self-Efficacy Scale (CTD-SES) - for assessing students' self-efficacy in applying life skills essential for personal talent development, acquisition of positive work habits, and career exploration. In Study 1, data were obtained from a large sample of Chinese middle-school students (N=15,113) in Grades 7-9 in Hong Kong. The CTD-SES is an 18-item questionnaire with subscales containing items that address students' orientations toward developing their own talents, acquiring and applying positive work habits, and exploring their career possibilities. Evidence is provided for internal consistency, temporal stability, and factor structure of the CTD-SES. Goodness of fit statistics provided support for a three-primary-factor-plus-higher-factor model, and this solution was used in the statistical analyses. The data also indicated that students with plans for university study reported significantly higher scores than those without on all three domains of career and talent development. In Study 2 (N=308) Grade 10 high-ability students' scores in CTD-SES were correlated with scores in career decision self-efficacy and academic performance. The development and validation of CTD-SES is the first step toward investigating career exploration, work habits, and talent development among Asian middle-school adolescents. © 2010 European Council for High Ability.
Persistent Identifierhttp://hdl.handle.net/10722/125469
ISSN
2021 Impact Factor: 1.563
2020 SCImago Journal Rankings: 0.461
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorYuen, Men_HK
dc.contributor.authorGysbers, NCen_HK
dc.contributor.authorChan, RMCen_HK
dc.contributor.authorLau, PSYen_HK
dc.contributor.authorShea, PMKen_HK
dc.date.accessioned2010-10-31T11:33:14Z-
dc.date.available2010-10-31T11:33:14Z-
dc.date.issued2010en_HK
dc.identifier.citationHigh Ability Studies, 2010, v. 21 n. 1, p. 47-62en_HK
dc.identifier.issn1359-8139en_HK
dc.identifier.urihttp://hdl.handle.net/10722/125469-
dc.description.abstractThis article describes the development of an instrument - the Career and Talent Development Self-Efficacy Scale (CTD-SES) - for assessing students' self-efficacy in applying life skills essential for personal talent development, acquisition of positive work habits, and career exploration. In Study 1, data were obtained from a large sample of Chinese middle-school students (N=15,113) in Grades 7-9 in Hong Kong. The CTD-SES is an 18-item questionnaire with subscales containing items that address students' orientations toward developing their own talents, acquiring and applying positive work habits, and exploring their career possibilities. Evidence is provided for internal consistency, temporal stability, and factor structure of the CTD-SES. Goodness of fit statistics provided support for a three-primary-factor-plus-higher-factor model, and this solution was used in the statistical analyses. The data also indicated that students with plans for university study reported significantly higher scores than those without on all three domains of career and talent development. In Study 2 (N=308) Grade 10 high-ability students' scores in CTD-SES were correlated with scores in career decision self-efficacy and academic performance. The development and validation of CTD-SES is the first step toward investigating career exploration, work habits, and talent development among Asian middle-school adolescents. © 2010 European Council for High Ability.en_HK
dc.languageengen_HK
dc.publisherRoutledge. The Journal's web site is located at http://www.tandf.co.uk/journals/titles/13598139.aspen_HK
dc.relation.ispartofHigh Ability Studiesen_HK
dc.rightsThis is an electronic version of an article published in High Ability Studies, 2010, v. 21 n. 1, p. 47-62. The article is available online at: http://www.tandfonline.com/doi/abs/10.1080/13598139.2010.488089-
dc.subjectAdolescentsen_HK
dc.subjectAssessmenten_HK
dc.subjectCareer developmenten_HK
dc.subjectChineseen_HK
dc.subjectIndividual planen_HK
dc.subjectLife skillsen_HK
dc.subjectMiddle schoolen_HK
dc.subjectSelf-efficacyen_HK
dc.subjectTalent developmenten_HK
dc.subjectWork habitsen_HK
dc.titleTalent development, work habits, and career exploration of Chinese middle-school adolescents: Development of the career and talent development self-efficacy scaleen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1359-8139&volume=21&issue=1&spage=47&epage=62&date=2010&atitle=Talent+development,+work+habits,+and+career+exploration+of+Chinese+middle-school+adolescents:+development+of+the+career+and+talent+development+self-efficacy+scaleen_HK
dc.identifier.emailYuen, M: mtyuen@hku.hken_HK
dc.identifier.authorityYuen, M=rp00984en_HK
dc.description.naturepostprint-
dc.identifier.doi10.1080/13598139.2010.488089en_HK
dc.identifier.scopuseid_2-s2.0-77953887272en_HK
dc.identifier.hkuros173389en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77953887272&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume21en_HK
dc.identifier.issue1en_HK
dc.identifier.spage47en_HK
dc.identifier.epage62en_HK
dc.identifier.eissn1469-834X-
dc.identifier.isiWOS:000278857300005-
dc.publisher.placeUnited Kingdomen_HK
dc.identifier.scopusauthoridYuen, M=7102031935en_HK
dc.identifier.scopusauthoridGysbers, NC=6601939549en_HK
dc.identifier.scopusauthoridChan, RMC=8603362000en_HK
dc.identifier.scopusauthoridLau, PSY=7102543576en_HK
dc.identifier.scopusauthoridShea, PMK=8429679300en_HK
dc.identifier.issnl1359-8139-

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