File Download
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1109/TED.2006.879676
- Scopus: eid_2-s2.0-33947155761
- WOS: WOS:000240076500050
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: A comparison of MISiC Schottky-diode hydrogen sensors made by NO, N 2O, or NH 3 nitridations
Title | A comparison of MISiC Schottky-diode hydrogen sensors made by NO, N 2O, or NH 3 nitridations |
---|---|
Authors | |
Keywords | Hydrogen Sensors Nitridation Silicon Carbide |
Issue Date | 2006 |
Publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=16 |
Citation | IEEE Transactions on Electron Devices, 2006, v. 53 n. 9, p. 2378-2383 How to Cite? |
Abstract | MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (nitric oxide (NO), N 2O, and NH 3) are fabricated. Steady-state and transien-t-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. This paper also finds that N 2O provides the fastest insulator growth with good insulator quality and hence the highest sensitivity among the three nitrided samples. The N 2O- nitrided sensor can give a significant response even at a low H 2 concentration of 48-ppm H 2 in N 2, indicating a potential application for detecting hydrogen leakage at high temperature. Moreover, the three nitrided samples respond faster than the control sample. At 300°C, the response times of the N 2O, NO, and NH 3-nitrided sample to the 48-ppm H 2 in N 2 are 11, 11, and 37 s, respectively, as compared to 65 s for the control sample without the gate insulator. © 2006 IEEE. |
Persistent Identifier | http://hdl.handle.net/10722/155357 |
ISSN | 2023 Impact Factor: 2.9 2023 SCImago Journal Rankings: 0.785 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Tang, WM | en_US |
dc.contributor.author | Lai, PT | en_US |
dc.contributor.author | Leung, CH | en_US |
dc.contributor.author | Xu, JP | en_US |
dc.date.accessioned | 2012-08-08T08:33:03Z | - |
dc.date.available | 2012-08-08T08:33:03Z | - |
dc.date.issued | 2006 | en_US |
dc.identifier.citation | IEEE Transactions on Electron Devices, 2006, v. 53 n. 9, p. 2378-2383 | en_US |
dc.identifier.issn | 0018-9383 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/155357 | - |
dc.description.abstract | MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (nitric oxide (NO), N 2O, and NH 3) are fabricated. Steady-state and transien-t-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. This paper also finds that N 2O provides the fastest insulator growth with good insulator quality and hence the highest sensitivity among the three nitrided samples. The N 2O- nitrided sensor can give a significant response even at a low H 2 concentration of 48-ppm H 2 in N 2, indicating a potential application for detecting hydrogen leakage at high temperature. Moreover, the three nitrided samples respond faster than the control sample. At 300°C, the response times of the N 2O, NO, and NH 3-nitrided sample to the 48-ppm H 2 in N 2 are 11, 11, and 37 s, respectively, as compared to 65 s for the control sample without the gate insulator. © 2006 IEEE. | en_US |
dc.language | eng | en_US |
dc.publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=16 | en_US |
dc.relation.ispartof | IEEE Transactions on Electron Devices | en_US |
dc.rights | ©2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. | - |
dc.subject | Hydrogen Sensors | en_US |
dc.subject | Nitridation | en_US |
dc.subject | Silicon Carbide | en_US |
dc.title | A comparison of MISiC Schottky-diode hydrogen sensors made by NO, N 2O, or NH 3 nitridations | en_US |
dc.type | Article | en_US |
dc.identifier.email | Lai, PT:laip@eee.hku.hk | en_US |
dc.identifier.email | Leung, CH:chleung@eee.hku.hk | en_US |
dc.identifier.authority | Lai, PT=rp00130 | en_US |
dc.identifier.authority | Leung, CH=rp00146 | en_US |
dc.description.nature | published_or_final_version | en_US |
dc.identifier.doi | 10.1109/TED.2006.879676 | en_US |
dc.identifier.scopus | eid_2-s2.0-33947155761 | en_US |
dc.identifier.hkuros | 135367 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-33947155761&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 53 | en_US |
dc.identifier.issue | 9 | en_US |
dc.identifier.spage | 2378 | en_US |
dc.identifier.epage | 2383 | en_US |
dc.identifier.isi | WOS:000240076500050 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Tang, WM=24438163600 | en_US |
dc.identifier.scopusauthorid | Lai, PT=7202946460 | en_US |
dc.identifier.scopusauthorid | Leung, CH=7402612415 | en_US |
dc.identifier.scopusauthorid | Xu, JP=35754128700 | en_US |
dc.identifier.issnl | 0018-9383 | - |