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Article: A polyferroplatinyne precursor for the rapid fabrication of L1 0-FePt-type bit patterned media by nanoimprint lithography

TitleA polyferroplatinyne precursor for the rapid fabrication of L1 0-FePt-type bit patterned media by nanoimprint lithography
Authors
Dong, QLi, GHo, CLFaisal, MLeung, CWPong, PWTLiu, KTang, BZManners, IWong, WY
KeywordsBit patterned media
FePt nanoparticles
Magnetic data recording
Metallopolymers
Nanoimprint lithography
Issue Date2012
PublisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089
Citation
Advanced Materials, 2012, v. 24 n. 8, p. 1034-1040 How to Cite?
DOI: http://dx.doi.org/10.1002/adma.201104171
AbstractA polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L1 0-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Persistent Identifierhttp://hdl.handle.net/10722/155729
ISSN
0935-9648
2023 Impact Factor: 27.4
2023 SCImago Journal Rankings: 9.191
ISI Accession Number ID
WOS:000300447900003
Funding AgencyGrant Number
Hong Kong Research Grants CouncilHKBU202508
HKUST2/CRF/10
University Grants CommitteeAoE/P-03/08
Hong Kong Baptist University of Hong Kong SARFRG2/09-10/091
Funding Information:

Q.C. Dong and G. J. Li contributed equally to this work. We acknowledge the financial support from the Hong Kong Research Grants Council (HKBU202508 and HKUST2/CRF/10), Areas of Excellence Scheme from the University Grants Committee (AoE/P-03/08) and a FRG grant from Hong Kong Baptist University of Hong Kong SAR (FRG2/09-10/091).

References
References in Scopus
Grants
Development of efficient luminogenic materials in the aggregate state: fundamental understanding and practical applications
Institute of Molecular Functional Materials

 

DC FieldValueLanguage
dc.contributor.authorDong, Qen_HK
dc.contributor.authorLi, Gen_HK
dc.contributor.authorHo, CLen_HK
dc.contributor.authorFaisal, Men_HK
dc.contributor.authorLeung, CWen_HK
dc.contributor.authorPong, PWTen_HK
dc.contributor.authorLiu, Ken_HK
dc.contributor.authorTang, BZen_HK
dc.contributor.authorManners, Ien_HK
dc.contributor.authorWong, WYen_HK
dc.date.accessioned2012-08-08T08:35:03Z-
dc.date.available2012-08-08T08:35:03Z-
dc.date.issued2012en_HK
dc.identifier.citationAdvanced Materials, 2012, v. 24 n. 8, p. 1034-1040en_HK
dc.identifier.issn0935-9648en_HK
dc.identifier.urihttp://hdl.handle.net/10722/155729-
dc.description.abstractA polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L1 0-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.en_HK
dc.languageengen_US
dc.publisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089en_HK
dc.relation.ispartofAdvanced Materialsen_HK
dc.subjectBit patterned mediaen_HK
dc.subjectFePt nanoparticlesen_HK
dc.subjectMagnetic data recordingen_HK
dc.subjectMetallopolymersen_HK
dc.subjectNanoimprint lithographyen_HK
dc.subject.meshAlloys - chemistry-
dc.subject.meshIron - chemistry-
dc.subject.meshNanoparticles - chemistry-
dc.subject.meshNanotechnology - methods-
dc.subject.meshPlatinum - chemistry-
dc.subject.meshPolymers - chemistry-
dc.subject.meshPrinting - methods-
dc.titleA polyferroplatinyne precursor for the rapid fabrication of L1 0-FePt-type bit patterned media by nanoimprint lithographyen_HK
dc.typeArticleen_HK
dc.identifier.emailHo, CL: lamlamho@HKUCC-COM.hku.hken_HK
dc.identifier.authorityHo, CL=rp00704en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1002/adma.201104171en_HK
dc.identifier.pmid22290721-
dc.identifier.scopuseid_2-s2.0-84863115892en_HK
dc.identifier.hkuros207607-
dc.identifier.hkuros227861-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-84863115892&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume24en_HK
dc.identifier.issue8en_HK
dc.identifier.spage1034en_HK
dc.identifier.epage1040en_HK
dc.identifier.eissn1521-4095-
dc.identifier.isiWOS:000300447900003-
dc.publisher.placeGermanyen_HK
dc.relation.projectDevelopment of efficient luminogenic materials in the aggregate state: fundamental understanding and practical applications-
dc.relation.projectInstitute of Molecular Functional Materials-
dc.identifier.scopusauthoridDong, Q=23981904700en_HK
dc.identifier.scopusauthoridLi, G=37002991600en_HK
dc.identifier.scopusauthoridHo, CL=10242268200en_HK
dc.identifier.scopusauthoridFaisal, M=25823793900en_HK
dc.identifier.scopusauthoridLeung, CW=22958301300en_HK
dc.identifier.scopusauthoridPong, PWT=55428301400en_HK
dc.identifier.scopusauthoridLiu, K=23667794600en_HK
dc.identifier.scopusauthoridTang, BZ=7402560926en_HK
dc.identifier.scopusauthoridManners, I=34571310800en_HK
dc.identifier.scopusauthoridWong, WY=7403972153en_HK
dc.identifier.citeulike10377333-
dc.identifier.issnl0935-9648-

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