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Conference Paper: Voltage dip immunity of equipment and installations - Status and need for further work

TitleVoltage dip immunity of equipment and installations - Status and need for further work
Authors
Bollen, MGordon, JRDjokic, SStockman, KMilanovic, JNeumann, REthier, GZavoda, FBrumsickle, BChapman, DLópez, FCCundeva, SFerguson, AGoossens, PLeborgne, RCLigot, PLeiria, AMarteyn, PMceachern, AMentzer, JMcmichael, IMeyer, JMinnaar, URedha, MVan Reusel, KStephens, MVegunta, SCZhong, J
KeywordsEquipment Immunity
Industrial Installations
Power Quality
Voltage Dips
Issue Date2010
Citation
2010 China International Conference On Electricity Distribution, Ciced 2010, 2010 How to Cite?
AbstractThis paper presents the results from the work of WG C4.110, a joint working group by CIGRE, CIRED and UIE. Its mandate period stretched from early 2006 through early 2009. The group has addressed several aspects of the immunity of, especially, industrial equipment against voltage dips. Compared to the work earlier groups, the equipment performance is not seen as a final aim, but as a step towards the ultimate aim: allowing the process to ride through the voltage dip. Some of the contributions and conclusions from the WG C4.110 are discussed in this paper, Check Mark Description of voltage dips, Check Mark Equipment and process immunity, Check Mark Testing and characterization, Check Mark Economics, Check Mark Immunity classes and application, Check Mark Further work. © 2010 Chinese Soc for Elec Eng.
Persistent Identifierhttp://hdl.handle.net/10722/158703
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorBollen, Men_US
dc.contributor.authorGordon, JRen_US
dc.contributor.authorDjokic, Sen_US
dc.contributor.authorStockman, Ken_US
dc.contributor.authorMilanovic, Jen_US
dc.contributor.authorNeumann, Ren_US
dc.contributor.authorEthier, Gen_US
dc.contributor.authorZavoda, Fen_US
dc.contributor.authorBrumsickle, Ben_US
dc.contributor.authorChapman, Den_US
dc.contributor.authorLópez, FCen_US
dc.contributor.authorCundeva, Sen_US
dc.contributor.authorFerguson, Aen_US
dc.contributor.authorGoossens, Pen_US
dc.contributor.authorLeborgne, RCen_US
dc.contributor.authorLigot, Pen_US
dc.contributor.authorLeiria, Aen_US
dc.contributor.authorMarteyn, Pen_US
dc.contributor.authorMceachern, Aen_US
dc.contributor.authorMentzer, Jen_US
dc.contributor.authorMcmichael, Ien_US
dc.contributor.authorMeyer, Jen_US
dc.contributor.authorMinnaar, Uen_US
dc.contributor.authorRedha, Men_US
dc.contributor.authorVan Reusel, Ken_US
dc.contributor.authorStephens, Men_US
dc.contributor.authorVegunta, SCen_US
dc.contributor.authorZhong, Jen_US
dc.date.accessioned2012-08-08T09:00:57Z-
dc.date.available2012-08-08T09:00:57Z-
dc.date.issued2010en_US
dc.identifier.citation2010 China International Conference On Electricity Distribution, Ciced 2010, 2010en_US
dc.identifier.urihttp://hdl.handle.net/10722/158703-
dc.description.abstractThis paper presents the results from the work of WG C4.110, a joint working group by CIGRE, CIRED and UIE. Its mandate period stretched from early 2006 through early 2009. The group has addressed several aspects of the immunity of, especially, industrial equipment against voltage dips. Compared to the work earlier groups, the equipment performance is not seen as a final aim, but as a step towards the ultimate aim: allowing the process to ride through the voltage dip. Some of the contributions and conclusions from the WG C4.110 are discussed in this paper, Check Mark Description of voltage dips, Check Mark Equipment and process immunity, Check Mark Testing and characterization, Check Mark Economics, Check Mark Immunity classes and application, Check Mark Further work. © 2010 Chinese Soc for Elec Eng.en_US
dc.languageengen_US
dc.relation.ispartof2010 China International Conference on Electricity Distribution, CICED 2010en_US
dc.subjectEquipment Immunityen_US
dc.subjectIndustrial Installationsen_US
dc.subjectPower Qualityen_US
dc.subjectVoltage Dipsen_US
dc.titleVoltage dip immunity of equipment and installations - Status and need for further worken_US
dc.typeConference_Paperen_US
dc.identifier.emailZhong, J:jinzhong@hkucc.hku.hken_US
dc.identifier.authorityZhong, J=rp00212en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.scopuseid_2-s2.0-79955012124en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-79955012124&selection=ref&src=s&origin=recordpageen_US
dc.identifier.scopusauthoridBollen, M=21933300000en_US
dc.identifier.scopusauthoridGordon, JR=24767581700en_US
dc.identifier.scopusauthoridDjokic, S=8418127200en_US
dc.identifier.scopusauthoridStockman, K=6603782992en_US
dc.identifier.scopusauthoridMilanovic, J=35508147600en_US
dc.identifier.scopusauthoridNeumann, R=24768046200en_US
dc.identifier.scopusauthoridEthier, G=25925880000en_US
dc.identifier.scopusauthoridZavoda, F=24922271500en_US
dc.identifier.scopusauthoridBrumsickle, B=25925667300en_US
dc.identifier.scopusauthoridChapman, D=9270946700en_US
dc.identifier.scopusauthoridLópez, FC=37087345800en_US
dc.identifier.scopusauthoridCundeva, S=24342909300en_US
dc.identifier.scopusauthoridFerguson, A=37118761500en_US
dc.identifier.scopusauthoridGoossens, P=9743548700en_US
dc.identifier.scopusauthoridLeborgne, RC=9743228300en_US
dc.identifier.scopusauthoridLigot, P=37119150300en_US
dc.identifier.scopusauthoridLeiria, A=13003036800en_US
dc.identifier.scopusauthoridMarteyn, P=37097584000en_US
dc.identifier.scopusauthoridMcEachern, A=6701640147en_US
dc.identifier.scopusauthoridMentzer, J=35305393800en_US
dc.identifier.scopusauthoridMcMichael, I=7004355352en_US
dc.identifier.scopusauthoridMeyer, J=37119254800en_US
dc.identifier.scopusauthoridMinnaar, U=24823002900en_US
dc.identifier.scopusauthoridRedha, M=37119212600en_US
dc.identifier.scopusauthoridVan Reusel, K=24438613700en_US
dc.identifier.scopusauthoridStephens, M=7201575240en_US
dc.identifier.scopusauthoridVegunta, SC=24073726800en_US
dc.identifier.scopusauthoridZhong, J=13905948700en_US

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