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  Patent History
  • Application
    AT 20060704680T 2006-01-11
  • Publication
    AT 485845 2010-11-15
  Patent Family
Supplementary

published patent: Surface treated shape memory materials and methods for making same

TitleSurface treated shape memory materials and methods for making same
Priority Date2005-01-13 US 11/643744P
2006-01-11 PCT/CN2006000038
Inventors
Yeung, KWKPoon, W. Y. RChu, Kimho PaulCheung, KMCLu, W
Issue Date2010
Citation
Austria Published Patent Application AT 485845. Austria: Austrian Patent Office, 2010 How to Cite?
AbstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.
Persistent Identifierhttp://hdl.handle.net/10722/176521

 

DC FieldValueLanguage
dc.date.accessioned2012-11-30T08:38:03Z-
dc.date.available2012-11-30T08:38:03Z-
dc.date.issued2010-
dc.identifier.citationAustria Published Patent Application AT 485845. Austria: Austrian Patent Office, 2010en_HK
dc.identifier.urihttp://hdl.handle.net/10722/176521-
dc.description.abstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.en_HK
dc.titleSurface treated shape memory materials and methods for making sameen_HK
dc.typePatenten_US
dc.contributor.inventorYeung, KWKen_HK
dc.contributor.inventorPoon, W. Y. Ren_HK
dc.contributor.inventorChu, Kimho Paulen_HK
dc.contributor.inventorCheung, KMCen_HK
dc.contributor.inventorLu, Wen_HK
patents.identifier.applicationAT 20060704680Ten_HK
patents.description.assigneeVERSITECH LTD [CN]; UNIV CITY HONG KONG [CN]en_HK
patents.description.countryAustriaen_HK
patents.date.publication2010-11-15en_HK
patents.date.application2006-01-11en_HK
patents.date.priority2005-01-13 US 11/643744Pen_HK
patents.date.priority2006-01-11 PCT/CN2006000038en_HK
patents.description.ccATen_HK
patents.identifier.publicationAT 485845en_HK
patents.relation.familyAT 485845 (T) 2010-11-15en_HK
patents.relation.familyCN 101128224 (A) 2008-02-20en_HK
patents.relation.familyEP 1835946 (A1) 2007-09-26en_HK
patents.relation.familyES 2356465 (T3) 2011-04-08en_HK
patents.relation.familyUS 2006157159 (A1) 2006-07-20en_HK
patents.relation.familyUS 7803234 (B2) 2010-09-28en_HK
patents.relation.familyWO 2006074604 (A1) 2006-07-20en_HK
patents.description.kindTen_HK
patents.typePatent_publisheden_HK

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