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Article: Magnetic Flux Concentration at Micrometer Scale

TitleMagnetic Flux Concentration at Micrometer Scale
Authors
SUN, XJiang, LPong, PWT
KeywordsFinite element method
Magnetic flux concentration
Magnetic gain
Magnetoresistive sensors
Issue Date2013
Citation
Microelectronic Engineering, 2013, v. 111, p. 77-81 How to Cite?
DOI: http://dx.doi.org/10.1016/j.mee.2013.01.063
Persistent Identifierhttp://hdl.handle.net/10722/185854
ISI Accession Number ID
WOS:000322751300014

 

DC FieldValueLanguage
dc.contributor.authorSUN, Xen_US
dc.contributor.authorJiang, Len_US
dc.contributor.authorPong, PWTen_US
dc.date.accessioned2013-08-20T11:44:01Z-
dc.date.available2013-08-20T11:44:01Z-
dc.date.issued2013en_US
dc.identifier.citationMicroelectronic Engineering, 2013, v. 111, p. 77-81en_US
dc.identifier.urihttp://hdl.handle.net/10722/185854-
dc.languageengen_US
dc.relation.ispartofMicroelectronic Engineeringen_US
dc.subjectFinite element method-
dc.subjectMagnetic flux concentration-
dc.subjectMagnetic gain-
dc.subjectMagnetoresistive sensors-
dc.titleMagnetic Flux Concentration at Micrometer Scaleen_US
dc.typeArticleen_US
dc.identifier.emailJiang, L: jianglj@hku.hken_US
dc.identifier.emailPong, PWT: ppong@eee.hku.hken_US
dc.identifier.authorityJiang, L=rp01338en_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.identifier.doi10.1016/j.mee.2013.01.063-
dc.identifier.scopuseid_2-s2.0-84885185999-
dc.identifier.hkuros218837en_US
dc.identifier.volume111en_US
dc.identifier.spage77en_US
dc.identifier.epage81en_US
dc.identifier.isiWOS:000322751300014-

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