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Article: Enhanced structural and magnetic ordering of FePt/TiOx bilayers by ion-beam deposition and annealing

TitleEnhanced structural and magnetic ordering of FePt/TiOx bilayers by ion-beam deposition and annealing
Authors
Li, GJLeung, CWWu, YJSun, ACHsu, JHLai, PTLin, KWPong, PWT
KeywordsAnnealing
Coercivity
FePt
Ion-beam deposition
Issue Date2013
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee
Citation
Microelectronic Engineering, 2013, v. 110, p. 250-255 How to Cite?
DOI: http://dx.doi.org/10.1016/j.mee.2013.01.042
Persistent Identifierhttp://hdl.handle.net/10722/185881
ISSN
0167-9317
2023 Impact Factor: 2.6
2023 SCImago Journal Rankings: 0.503
ISI Accession Number ID
WOS:000326003600049

 

DC FieldValueLanguage
dc.contributor.authorLi, GJen_US
dc.contributor.authorLeung, CWen_US
dc.contributor.authorWu, YJen_US
dc.contributor.authorSun, ACen_US
dc.contributor.authorHsu, JHen_US
dc.contributor.authorLai, PTen_US
dc.contributor.authorLin, KWen_US
dc.contributor.authorPong, PWTen_US
dc.date.accessioned2013-08-20T11:44:12Z-
dc.date.available2013-08-20T11:44:12Z-
dc.date.issued2013en_US
dc.identifier.citationMicroelectronic Engineering, 2013, v. 110, p. 250-255en_US
dc.identifier.issn0167-9317-
dc.identifier.urihttp://hdl.handle.net/10722/185881-
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee-
dc.relation.ispartofMicroelectronic Engineeringen_US
dc.subjectAnnealing-
dc.subjectCoercivity-
dc.subjectFePt-
dc.subjectIon-beam deposition-
dc.titleEnhanced structural and magnetic ordering of FePt/TiOx bilayers by ion-beam deposition and annealingen_US
dc.typeArticleen_US
dc.identifier.emailLai, PT: laip@eee.hku.hken_US
dc.identifier.emailPong, PWT: ppong@eee.hku.hken_US
dc.identifier.authorityLai, PT=rp00130en_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.identifier.doi10.1016/j.mee.2013.01.042-
dc.identifier.scopuseid_2-s2.0-84885186094-
dc.identifier.hkuros219722en_US
dc.identifier.hkuros227866-
dc.identifier.volume110en_US
dc.identifier.spage250en_US
dc.identifier.epage255en_US
dc.identifier.isiWOS:000326003600049-
dc.publisher.placeNetherlands-
dc.identifier.issnl0167-9317-

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