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- Publisher Website: 10.1364/OE.22.003924
- Scopus: eid_2-s2.0-84894779371
- PMID: 24663713
- WOS: WOS:000332520000023
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Article: Efficient source mask optimization with Zernike polynomial functions for source representation
Title | Efficient source mask optimization with Zernike polynomial functions for source representation |
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Authors | |
Issue Date | 2014 |
Publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org |
Citation | Optics Express, 2014, v. 22 n. 4, p. 3924-3937 How to Cite? |
Abstract | In 22nm optical lithography and beyond, source mask optimization (SMO) becomes vital for the continuation of advanced ArF technology node development. The pixel-based method permits a large solution space, but involves a time-consuming optimization procedure because of the large number of pixel variables. In this paper, we introduce the Zernike polynomials as basis functions to represent the source patterns, and propose an improved SMO algorithm with this representation. The source patterns are decomposed into the weighted superposition of some well-chosen Zernike polynomial functions, and the number of variables decreases significantly. We compare the computation efficiency and optimization performance between the proposed method and the conventional pixel-based algorithm. Simulation results demonstrate that the former can obtain substantial speedup of source optimization while improving the pattern fidelity at the same time. |
Persistent Identifier | http://hdl.handle.net/10722/200622 |
ISSN | 2023 Impact Factor: 3.2 2023 SCImago Journal Rankings: 0.998 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Wu, X | en_US |
dc.contributor.author | Liu, S | en_US |
dc.contributor.author | Li, J | en_US |
dc.contributor.author | Lam, EYM | en_US |
dc.date.accessioned | 2014-08-21T06:52:43Z | - |
dc.date.available | 2014-08-21T06:52:43Z | - |
dc.date.issued | 2014 | en_US |
dc.identifier.citation | Optics Express, 2014, v. 22 n. 4, p. 3924-3937 | en_US |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | http://hdl.handle.net/10722/200622 | - |
dc.description.abstract | In 22nm optical lithography and beyond, source mask optimization (SMO) becomes vital for the continuation of advanced ArF technology node development. The pixel-based method permits a large solution space, but involves a time-consuming optimization procedure because of the large number of pixel variables. In this paper, we introduce the Zernike polynomials as basis functions to represent the source patterns, and propose an improved SMO algorithm with this representation. The source patterns are decomposed into the weighted superposition of some well-chosen Zernike polynomial functions, and the number of variables decreases significantly. We compare the computation efficiency and optimization performance between the proposed method and the conventional pixel-based algorithm. Simulation results demonstrate that the former can obtain substantial speedup of source optimization while improving the pattern fidelity at the same time. | - |
dc.language | eng | en_US |
dc.publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org | - |
dc.relation.ispartof | Optics Express | en_US |
dc.rights | Optics Express. Copyright © Optical Society of America. | - |
dc.rights | This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-22-4-3924. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. | - |
dc.title | Efficient source mask optimization with Zernike polynomial functions for source representation | en_US |
dc.type | Article | en_US |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EYM=rp00131 | en_US |
dc.description.nature | published_or_final_version | - |
dc.identifier.doi | 10.1364/OE.22.003924 | - |
dc.identifier.pmid | 24663713 | - |
dc.identifier.scopus | eid_2-s2.0-84894779371 | - |
dc.identifier.hkuros | 233674 | en_US |
dc.identifier.volume | 22 | - |
dc.identifier.issue | 4 | - |
dc.identifier.spage | 3924 | - |
dc.identifier.epage | 3937 | - |
dc.identifier.isi | WOS:000332520000023 | - |
dc.publisher.place | United States | - |
dc.identifier.issnl | 1094-4087 | - |