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Conference Paper: Efficient source and mask optimization with augmented Lagrangian methods in optical lithography
Title | Efficient source and mask optimization with augmented Lagrangian methods in optical lithography |
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Authors | |
Issue Date | 2013 |
Citation | The 11th Fraunhofer IISB Lithography Simulation Workshop, Hersbruck, Germany, 26-28 September 2013. How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/201233 |
DC Field | Value | Language |
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dc.contributor.author | Li, J | en_US |
dc.contributor.author | Liu, S | en_US |
dc.contributor.author | Lam, EY | en_US |
dc.date.accessioned | 2014-08-21T07:18:19Z | - |
dc.date.available | 2014-08-21T07:18:19Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.citation | The 11th Fraunhofer IISB Lithography Simulation Workshop, Hersbruck, Germany, 26-28 September 2013. | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/201233 | - |
dc.language | eng | en_US |
dc.relation.ispartof | 11th Fraunhofer IISB Lithography Simulation Workshop 2013 | en_US |
dc.title | Efficient source and mask optimization with augmented Lagrangian methods in optical lithography | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Lam, EY: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EY=rp00131 | en_US |
dc.identifier.hkuros | 233723 | en_US |