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Article: Effect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers

TitleEffect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers
Authors
KeywordsExchange bias
Ion-beam bombardment
Magnetic thin films
Issue Date2014
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2014, v. 570 n. pt. B, p. 383-389 How to Cite?
AbstractThe research on exchange coupled ferromagnetic/antiferromagnetic (FM/AF) bilayers has been the foundation of spintronic applications such as hard disk reading heads and spin torque oscillators. In order to further explore the exchange bias behavior of NiCo/(Ni, Co)O bilayers, effect of field cooling process, magnetic angular dependence, and ion-beam bombardment was investigated. The difference in film composition resulted in remarkable distinction in crystalline structures and domain patterns. The exchange bias field (Hex) in the bilayer systems exhibited a strong angular dependence. The negative Hex after a field cooling process indicated that the polarity of Hex can be defined by aligning the magnetization orientation of the FM NiCo layer with the applied field. Moreover, enhanced exchange bias effect was observed in the NiCo/(Ni, Co)O bilayers that resulted from the surface of the (Ni, Co)O layers bombarded with different Ar+ ion-beam energies using End-Hall voltages from 0 V to 150 V. The interface spin structures as well as the surface domain patterns were altered by the ion-beam bombardment process. These results indicated that the exchange bias field of NiCo/(Ni, Co)O bilayer systems could be tailored by field cooling process, angular dependence of magnetic properties, and post ion-beam bombardment.
Persistent Identifierhttp://hdl.handle.net/10722/202808
ISSN
2021 Impact Factor: 2.358
2020 SCImago Journal Rankings: 0.544
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLi, X-
dc.contributor.authorLin, KW-
dc.contributor.authorLiu, HY-
dc.contributor.authorWei, DH-
dc.contributor.authorLi, GJ-
dc.contributor.authorPong, PWT-
dc.date.accessioned2014-09-19T10:07:57Z-
dc.date.available2014-09-19T10:07:57Z-
dc.date.issued2014-
dc.identifier.citationThin Solid Films, 2014, v. 570 n. pt. B, p. 383-389-
dc.identifier.issn0040-6090-
dc.identifier.urihttp://hdl.handle.net/10722/202808-
dc.description.abstractThe research on exchange coupled ferromagnetic/antiferromagnetic (FM/AF) bilayers has been the foundation of spintronic applications such as hard disk reading heads and spin torque oscillators. In order to further explore the exchange bias behavior of NiCo/(Ni, Co)O bilayers, effect of field cooling process, magnetic angular dependence, and ion-beam bombardment was investigated. The difference in film composition resulted in remarkable distinction in crystalline structures and domain patterns. The exchange bias field (Hex) in the bilayer systems exhibited a strong angular dependence. The negative Hex after a field cooling process indicated that the polarity of Hex can be defined by aligning the magnetization orientation of the FM NiCo layer with the applied field. Moreover, enhanced exchange bias effect was observed in the NiCo/(Ni, Co)O bilayers that resulted from the surface of the (Ni, Co)O layers bombarded with different Ar+ ion-beam energies using End-Hall voltages from 0 V to 150 V. The interface spin structures as well as the surface domain patterns were altered by the ion-beam bombardment process. These results indicated that the exchange bias field of NiCo/(Ni, Co)O bilayer systems could be tailored by field cooling process, angular dependence of magnetic properties, and post ion-beam bombardment.-
dc.languageeng-
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf-
dc.relation.ispartofThin Solid Films-
dc.subjectExchange bias-
dc.subjectIon-beam bombardment-
dc.subjectMagnetic thin films-
dc.titleEffect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers-
dc.typeArticle-
dc.identifier.emailPong, PWT: ppong@eee.hku.hk-
dc.identifier.authorityPong, PWT=rp00217-
dc.identifier.doi10.1016/j.tsf.2014.03.032-
dc.identifier.scopuseid_2-s2.0-84912000131-
dc.identifier.hkuros235670-
dc.identifier.volume570-
dc.identifier.issuept. B-
dc.identifier.spage383-
dc.identifier.epage389-
dc.identifier.isiWOS:000345230900039-
dc.publisher.placeSwitzerland-
dc.identifier.issnl0040-6090-

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