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Conference Paper: Microstructural and magnetic characterization of ion-beam bomdarded [Ni80Fe20-Cr]50 thin films
Title | Microstructural and magnetic characterization of ion-beam bomdarded [Ni80Fe20-Cr]50 thin films |
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Authors | |
Issue Date | 2014 |
Publisher | IEEE. |
Citation | The 3rd International Symposium on Next-Generation Electronics (ISNE 2014), Taoyuan, Taiwan, 7-10 May 2014. How to Cite? |
Abstract | We studied plain (un-bombarded) and argon ion-beam bombarded multilayered [Ni80Fe20-Cr]50 thin films fabricated using a dual ion-beam deposition technique. The atomic force microscope (AFM) images of the bombarded thin films showed a much rougher surface and an increased average grain size. An enhancement of the coercivity attributed to the stronger NiFe-Cr coupling was found. The bombarded thin film also exhibited a higher ZFC/FC divergence temperature, which indicated a much stronger NiFe-Cr coupling and more coordinated alignment of the magnetization of the film’s larger crystallites. Copyright © IEEE. |
Description | Oral Presentation 6 - Symposium M2 (Thin Film Materials and Sensors): no. M2-4 |
Persistent Identifier | http://hdl.handle.net/10722/203997 |
DC Field | Value | Language |
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dc.contributor.author | Zheng, C | en_US |
dc.contributor.author | Lin, KW | en_US |
dc.contributor.author | Liu, CH | en_US |
dc.contributor.author | Leung, CW | en_US |
dc.contributor.author | Chen, YH | en_US |
dc.contributor.author | Wu, TH | en_US |
dc.contributor.author | Desautels, RD | en_US |
dc.contributor.author | van Lierop, J | en_US |
dc.contributor.author | Pong, PWT | en_US |
dc.date.accessioned | 2014-09-19T20:01:29Z | - |
dc.date.available | 2014-09-19T20:01:29Z | - |
dc.date.issued | 2014 | en_US |
dc.identifier.citation | The 3rd International Symposium on Next-Generation Electronics (ISNE 2014), Taoyuan, Taiwan, 7-10 May 2014. | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/203997 | - |
dc.description | Oral Presentation 6 - Symposium M2 (Thin Film Materials and Sensors): no. M2-4 | - |
dc.description.abstract | We studied plain (un-bombarded) and argon ion-beam bombarded multilayered [Ni80Fe20-Cr]50 thin films fabricated using a dual ion-beam deposition technique. The atomic force microscope (AFM) images of the bombarded thin films showed a much rougher surface and an increased average grain size. An enhancement of the coercivity attributed to the stronger NiFe-Cr coupling was found. The bombarded thin film also exhibited a higher ZFC/FC divergence temperature, which indicated a much stronger NiFe-Cr coupling and more coordinated alignment of the magnetization of the film’s larger crystallites. Copyright © IEEE. | - |
dc.language | eng | en_US |
dc.publisher | IEEE. | en_US |
dc.relation.ispartof | International Symposium on Next-Generation Electronics (ISNE) | en_US |
dc.rights | International Symposium on Next-Generation Electronics (ISNE). Copyright © IEEE. | en_US |
dc.title | Microstructural and magnetic characterization of ion-beam bomdarded [Ni80Fe20-Cr]50 thin films | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Pong, PWT: ppong@eee.hku.hk | en_US |
dc.identifier.authority | Pong, PWT=rp00217 | en_US |
dc.identifier.hkuros | 236056 | en_US |
dc.publisher.place | United States | - |
dc.customcontrol.immutable | sml 150120 | - |