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Conference Paper: Process induced magnetic sensitivity variation in sectorial split-drain magentic field-effect transistor

TitleProcess induced magnetic sensitivity variation in sectorial split-drain magentic field-effect transistor
Authors
KeywordsMAGFET
Split-drain
Sectorial
Sensitivity
Process variation
Issue Date2014
PublisherIEEE.
Citation
The 3rd International Symposium on Next-Generation Electronics (ISNE 2014), Taoyuan, Taiwan, 7-10 May 2014. How to Cite?
AbstractThis paper dissects the effect of the statistical variation of sector angle to magnetic sensitivity in sectorial split-drain magnetic field effect transistors (SD-MAGFETs). The magnetic sensitivity of sectorial SD-MAGFET depends on both the sector angle and the charge trapping effect along the channel boundary. Our empirical studies showed that both factors are affected by the statistical variation of the sector angle, and each becomes the dominating effect at different sector angle range. As a result, we proposed a statistical model for the process induced magnetic sensitivity, which is useful for the prediction of the appropriate sector angle that achieves the smallest magnetic sensitivity variation brought by the process induced variation. The developed model is empirical, which also demonstrate the existence of an optimal sector angle with respect to process variation. Copyright © IEEE.
DescriptionOral Presentation 1 - Symposium K1 (Transparent and Metal Oxide Electronics): no. K1-6 (Invited)
Persistent Identifierhttp://hdl.handle.net/10722/203998

 

DC FieldValueLanguage
dc.contributor.authorTam, WSen_US
dc.contributor.authorSiu, SLen_US
dc.contributor.authorKok, CWen_US
dc.contributor.authorLeung, CWen_US
dc.contributor.authorPong, PWTen_US
dc.contributor.authorWong, H-
dc.date.accessioned2014-09-19T20:01:35Z-
dc.date.available2014-09-19T20:01:35Z-
dc.date.issued2014en_US
dc.identifier.citationThe 3rd International Symposium on Next-Generation Electronics (ISNE 2014), Taoyuan, Taiwan, 7-10 May 2014.en_US
dc.identifier.urihttp://hdl.handle.net/10722/203998-
dc.descriptionOral Presentation 1 - Symposium K1 (Transparent and Metal Oxide Electronics): no. K1-6 (Invited)-
dc.description.abstractThis paper dissects the effect of the statistical variation of sector angle to magnetic sensitivity in sectorial split-drain magnetic field effect transistors (SD-MAGFETs). The magnetic sensitivity of sectorial SD-MAGFET depends on both the sector angle and the charge trapping effect along the channel boundary. Our empirical studies showed that both factors are affected by the statistical variation of the sector angle, and each becomes the dominating effect at different sector angle range. As a result, we proposed a statistical model for the process induced magnetic sensitivity, which is useful for the prediction of the appropriate sector angle that achieves the smallest magnetic sensitivity variation brought by the process induced variation. The developed model is empirical, which also demonstrate the existence of an optimal sector angle with respect to process variation. Copyright © IEEE.-
dc.languageengen_US
dc.publisherIEEE.en_US
dc.relation.ispartofInternational Symposium on Next-Generation Electronics (ISNE)en_US
dc.rightsInternational Symposium on Next-Generation Electronics (ISNE)Sr. Copyright © IEEE.en_US
dc.subjectMAGFET-
dc.subjectSplit-drain-
dc.subjectSectorial-
dc.subjectSensitivity-
dc.subjectProcess variation-
dc.titleProcess induced magnetic sensitivity variation in sectorial split-drain magentic field-effect transistoren_US
dc.typeConference_Paperen_US
dc.identifier.emailPong, PWT: ppong@eee.hku.hken_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.identifier.hkuros236062en_US
dc.publisher.placeUnited States-
dc.customcontrol.immutablesml 150120-

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