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Article: Illumination source optimization in optical lithography via derivative-free optimization

TitleIllumination source optimization in optical lithography via derivative-free optimization
Authors
Lyu, WLiu, SWU, XLam, EYM
Issue Date2014
Citation
Journal of the Optical Society of America A, 2014, v. 31, p. B19 How to Cite?
DOI: http://dx.doi.org/10.1364/JOSAA.31.000B19
Persistent Identifierhttp://hdl.handle.net/10722/211755
ISSN
1084-7529
2021 Impact Factor: 2.104
2020 SCImago Journal Rankings: 0.803
ISI Accession Number ID
WOS:000345902400003

 

DC FieldValueLanguage
dc.contributor.authorLyu, W-
dc.contributor.authorLiu, S-
dc.contributor.authorWU, X-
dc.contributor.authorLam, EYM-
dc.date.accessioned2015-07-21T02:10:02Z-
dc.date.available2015-07-21T02:10:02Z-
dc.date.issued2014-
dc.identifier.citationJournal of the Optical Society of America A, 2014, v. 31, p. B19-
dc.identifier.issn1084-7529-
dc.identifier.urihttp://hdl.handle.net/10722/211755-
dc.languageeng-
dc.relation.ispartofJournal of the Optical Society of America A-
dc.titleIllumination source optimization in optical lithography via derivative-free optimization-
dc.typeArticle-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.doi10.1364/JOSAA.31.000B19-
dc.identifier.scopuseid_2-s2.0-84942363289-
dc.identifier.hkuros245273-
dc.identifier.volume31-
dc.identifier.spageB19-
dc.identifier.epageB19-
dc.identifier.eissn1520-8532-
dc.identifier.isiWOS:000345902400003-
dc.identifier.issnl1084-7529-

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