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Article: The effects of post-deposition ion-beam bombardment with oxygen on the Co surface in modifying the magnetic properties of Co thin films

TitleThe effects of post-deposition ion-beam bombardment with oxygen on the Co surface in modifying the magnetic properties of Co thin films
Authors
KeywordsCobalt
Ion-beam bombardment
Magnetic property
Issue Date2016
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee
Citation
Microelectronic Engineering, 2016, v. 152, p. 41-47 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/231954
ISSN
2021 Impact Factor: 2.662
2020 SCImago Journal Rankings: 0.553
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLI, X-
dc.contributor.authorLin, K.W.-
dc.contributor.authorLiang, H.T.-
dc.contributor.authorLiu, P.L.-
dc.contributor.authorLo, W.C.-
dc.contributor.authorCortie, D.L.-
dc.contributor.authorKlose, F.-
dc.contributor.authorLierop, J. VAN-
dc.contributor.authorLi, L-
dc.contributor.authorPong, PWT-
dc.date.accessioned2016-09-20T05:26:36Z-
dc.date.available2016-09-20T05:26:36Z-
dc.date.issued2016-
dc.identifier.citationMicroelectronic Engineering, 2016, v. 152, p. 41-47-
dc.identifier.issn0167-9317-
dc.identifier.urihttp://hdl.handle.net/10722/231954-
dc.languageeng-
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/mee-
dc.relation.ispartofMicroelectronic Engineering-
dc.rightsPosting accepted manuscript (postprint): © <year>. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/-
dc.subjectCobalt-
dc.subjectIon-beam bombardment-
dc.subjectMagnetic property-
dc.titleThe effects of post-deposition ion-beam bombardment with oxygen on the Co surface in modifying the magnetic properties of Co thin films-
dc.typeArticle-
dc.identifier.emailPong, PWT: ppong@hkucc.hku.hk-
dc.identifier.authorityPong, PWT=rp00217-
dc.identifier.doi10.1016/j.mee.2015.12.019-
dc.identifier.scopuseid_2-s2.0-84953298925-
dc.identifier.hkuros265536-
dc.identifier.volume152-
dc.identifier.spage41-
dc.identifier.epage47-
dc.identifier.isiWOS:000385991400007-
dc.publisher.placeNetherlands-
dc.identifier.issnl0167-9317-

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