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- Publisher Website: 10.1109/NANO.2003.1230985
- Scopus: eid_2-s2.0-84943596769
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Conference Paper: Subwavelength nanolithography using surface plasmons
Title | Subwavelength nanolithography using surface plasmons |
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Authors | |
Keywords | Resists Plasmons Optical surface waves Nanolithography Aluminum Lithography Dielectric materials Apertures Surface waves Surface treatment |
Issue Date | 2003 |
Citation | Proceedings of the IEEE Conference on Nanotechnology, 2003, v. 2, p. 609-611 How to Cite? |
Abstract | © 2003 IEEE. We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through a plasmonic mask, which is an opaque metal film with subwavelength hole arrays in it. The hole arrays of various diameters are fabricated by using focused ion beam (FIB). Through the lithography, the hole array patterns are transferred to negative photoresists. As a result, high contrast dot arrays with the smallest diameter of 120 nm, equivalent to ∼λ/3, are observed by atomic force microscope (AFM). |
Persistent Identifier | http://hdl.handle.net/10722/256740 |
ISSN | 2020 SCImago Journal Rankings: 0.120 |
DC Field | Value | Language |
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dc.contributor.author | Srituravanich, W. | - |
dc.contributor.author | Fang, N. | - |
dc.contributor.author | Sun, C. | - |
dc.contributor.author | Luo, Q. | - |
dc.contributor.author | Zhang, X. | - |
dc.date.accessioned | 2018-07-24T08:57:46Z | - |
dc.date.available | 2018-07-24T08:57:46Z | - |
dc.date.issued | 2003 | - |
dc.identifier.citation | Proceedings of the IEEE Conference on Nanotechnology, 2003, v. 2, p. 609-611 | - |
dc.identifier.issn | 1944-9399 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256740 | - |
dc.description.abstract | © 2003 IEEE. We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through a plasmonic mask, which is an opaque metal film with subwavelength hole arrays in it. The hole arrays of various diameters are fabricated by using focused ion beam (FIB). Through the lithography, the hole array patterns are transferred to negative photoresists. As a result, high contrast dot arrays with the smallest diameter of 120 nm, equivalent to ∼λ/3, are observed by atomic force microscope (AFM). | - |
dc.language | eng | - |
dc.relation.ispartof | Proceedings of the IEEE Conference on Nanotechnology | - |
dc.subject | Resists | - |
dc.subject | Plasmons | - |
dc.subject | Optical surface waves | - |
dc.subject | Nanolithography | - |
dc.subject | Aluminum | - |
dc.subject | Lithography | - |
dc.subject | Dielectric materials | - |
dc.subject | Apertures | - |
dc.subject | Surface waves | - |
dc.subject | Surface treatment | - |
dc.title | Subwavelength nanolithography using surface plasmons | - |
dc.type | Conference_Paper | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1109/NANO.2003.1230985 | - |
dc.identifier.scopus | eid_2-s2.0-84943596769 | - |
dc.identifier.volume | 2 | - |
dc.identifier.spage | 609 | - |
dc.identifier.epage | 611 | - |
dc.identifier.eissn | 1944-9380 | - |