File Download
There are no files associated with this item.
Supplementary
-
Citations:
- Scopus: 0
- Appears in Collections:
Conference Paper: Photon transport and photochemical reaction in laser micro-stereolithography
Title | Photon transport and photochemical reaction in laser micro-stereolithography |
---|---|
Authors | |
Keywords | Diffusion Pulsed laser photopolymerization (PLP) Microstereolithography(μSL) |
Issue Date | 2001 |
Citation | Proceedings of the International Conference on Energy Conversion and Application (ICECA'2001), 2001, p. 1146-1150 How to Cite? |
Abstract | The resolution in microstereolithography(μSL) is highly dependent on the photopolymerization process. Using finite volume method to simulate a photon induced polymerization in HDDA with Gaussian illumination on the surface, a numerical model is developed to consider the influence of diffusion dominant effect under high intensity. Simulations were performed to investigate the growth of conversion profile as a consequence of competition between photochemical reaction and mass diffusion. Numerical result reveals some interesting phenomena under illumination of high intensity. A solution of pulsed laser curing is proposed in order to improve the resolution in μSL process. |
Persistent Identifier | http://hdl.handle.net/10722/256870 |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zhang, Xiang | - |
dc.contributor.author | Fang, Nicholas | - |
dc.contributor.author | Sun, Cheng | - |
dc.date.accessioned | 2018-07-24T08:58:10Z | - |
dc.date.available | 2018-07-24T08:58:10Z | - |
dc.date.issued | 2001 | - |
dc.identifier.citation | Proceedings of the International Conference on Energy Conversion and Application (ICECA'2001), 2001, p. 1146-1150 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256870 | - |
dc.description.abstract | The resolution in microstereolithography(μSL) is highly dependent on the photopolymerization process. Using finite volume method to simulate a photon induced polymerization in HDDA with Gaussian illumination on the surface, a numerical model is developed to consider the influence of diffusion dominant effect under high intensity. Simulations were performed to investigate the growth of conversion profile as a consequence of competition between photochemical reaction and mass diffusion. Numerical result reveals some interesting phenomena under illumination of high intensity. A solution of pulsed laser curing is proposed in order to improve the resolution in μSL process. | - |
dc.language | eng | - |
dc.relation.ispartof | Proceedings of the International Conference on Energy Conversion and Application (ICECA'2001) | - |
dc.subject | Diffusion | - |
dc.subject | Pulsed laser photopolymerization (PLP) | - |
dc.subject | Microstereolithography(μSL) | - |
dc.title | Photon transport and photochemical reaction in laser micro-stereolithography | - |
dc.type | Conference_Paper | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.scopus | eid_2-s2.0-0035785094 | - |
dc.identifier.spage | 1146 | - |
dc.identifier.epage | 1150 | - |