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- Publisher Website: 10.1109/TED.2017.2777938
- Scopus: eid_2-s2.0-85038378586
- WOS: WOS:000418753200011
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Article: GaAs Metal–Oxide–Semiconductor Capacitor With Nd-Based High-k Oxynitrides as Gate Dielectric and Passivation Layer
Title | GaAs Metal–Oxide–Semiconductor Capacitor With Nd-Based High-k Oxynitrides as Gate Dielectric and Passivation Layer |
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Authors | |
Keywords | GaAs metal-oxide-semiconductor (MOS) Interface states density Interfacial passivation layer (IPL) Nd-based high-k |
Issue Date | 2018 |
Citation | IEEE Transactions on Electron Devices, 2018, v. 65, p. 72-78 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/261761 |
ISSN | 2023 Impact Factor: 2.9 2023 SCImago Journal Rankings: 0.785 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | LIU, L | - |
dc.contributor.author | Choi, HW | - |
dc.contributor.author | Xu, JP | - |
dc.contributor.author | Tang, WM | - |
dc.contributor.author | Lai, PT | - |
dc.date.accessioned | 2018-09-28T04:47:26Z | - |
dc.date.available | 2018-09-28T04:47:26Z | - |
dc.date.issued | 2018 | - |
dc.identifier.citation | IEEE Transactions on Electron Devices, 2018, v. 65, p. 72-78 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | http://hdl.handle.net/10722/261761 | - |
dc.language | eng | - |
dc.relation.ispartof | IEEE Transactions on Electron Devices | - |
dc.subject | GaAs metal-oxide-semiconductor (MOS) | - |
dc.subject | Interface states density | - |
dc.subject | Interfacial passivation layer (IPL) | - |
dc.subject | Nd-based high-k | - |
dc.title | GaAs Metal–Oxide–Semiconductor Capacitor With Nd-Based High-k Oxynitrides as Gate Dielectric and Passivation Layer | - |
dc.type | Article | - |
dc.identifier.email | Choi, HW: hwchoi@hku.hk | - |
dc.identifier.email | Lai, PT: laip@eee.hku.hk | - |
dc.identifier.authority | Choi, HW=rp00108 | - |
dc.identifier.authority | Lai, PT=rp00130 | - |
dc.identifier.doi | 10.1109/TED.2017.2777938 | - |
dc.identifier.scopus | eid_2-s2.0-85038378586 | - |
dc.identifier.hkuros | 292223 | - |
dc.identifier.volume | 65 | - |
dc.identifier.spage | 72 | - |
dc.identifier.epage | 78 | - |
dc.identifier.eissn | 1557-9646 | - |
dc.identifier.isi | WOS:000418753200011 | - |
dc.identifier.issnl | 0018-9383 | - |