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- Publisher Website: 10.1109/TDMR.2012.2190414
- Scopus: eid_2-s2.0-84862016676
- WOS: WOS:000305085100038
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Article: Vth shift in single-layer graphene field-effect transistors and its correlation with raman inspection
Title | V<inf>th</inf> shift in single-layer graphene field-effect transistors and its correlation with raman inspection |
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Authors | |
Keywords | negative bias temperature instability (NBTI) Graphene field-effect transistors (GFETs) Raman positive bias temperature instability (PBTI) |
Issue Date | 2012 |
Citation | IEEE Transactions on Device and Materials Reliability, 2012, v. 12, n. 2, p. 478-481 How to Cite? |
Abstract | Raman measurement is carried out to understand V th shift in single-layer graphene field-effect transistors (GFETs). The G (2D) peak shift in Raman spectra is correlated to the corresponding ΔV th during stress and recovery phases. A blue (red) shift of G and 2D peaks is seen during stress (recovery) phase, indicating the corresponding trapping (detrapping) effects in the graphene device. It is interesting to note that, after forming gas annealing (H 2/Ar), the defects can be generated in graphene (evidenced by D peak of Raman spectra), leading to the increased ΔV th for both negative bias temperature instability and positive bias temperature instability in single-layer GFETs. © 2012 IEEE. |
Persistent Identifier | http://hdl.handle.net/10722/286869 |
ISSN | 2023 Impact Factor: 2.5 2023 SCImago Journal Rankings: 0.436 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Liu, W. J. | - |
dc.contributor.author | Sun, X. W. | - |
dc.contributor.author | Tran, X. A. | - |
dc.contributor.author | Fang, Z. | - |
dc.contributor.author | Wang, Z. R. | - |
dc.contributor.author | Wang, F. | - |
dc.contributor.author | Wu, L. | - |
dc.contributor.author | Zhang, J. F. | - |
dc.contributor.author | Wei, J. | - |
dc.contributor.author | Zhu, H. L. | - |
dc.contributor.author | Yu, H. Y. | - |
dc.date.accessioned | 2020-09-07T11:45:53Z | - |
dc.date.available | 2020-09-07T11:45:53Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | IEEE Transactions on Device and Materials Reliability, 2012, v. 12, n. 2, p. 478-481 | - |
dc.identifier.issn | 1530-4388 | - |
dc.identifier.uri | http://hdl.handle.net/10722/286869 | - |
dc.description.abstract | Raman measurement is carried out to understand V th shift in single-layer graphene field-effect transistors (GFETs). The G (2D) peak shift in Raman spectra is correlated to the corresponding ΔV th during stress and recovery phases. A blue (red) shift of G and 2D peaks is seen during stress (recovery) phase, indicating the corresponding trapping (detrapping) effects in the graphene device. It is interesting to note that, after forming gas annealing (H 2/Ar), the defects can be generated in graphene (evidenced by D peak of Raman spectra), leading to the increased ΔV th for both negative bias temperature instability and positive bias temperature instability in single-layer GFETs. © 2012 IEEE. | - |
dc.language | eng | - |
dc.relation.ispartof | IEEE Transactions on Device and Materials Reliability | - |
dc.subject | negative bias temperature instability (NBTI) | - |
dc.subject | Graphene field-effect transistors (GFETs) | - |
dc.subject | Raman | - |
dc.subject | positive bias temperature instability (PBTI) | - |
dc.title | V<inf>th</inf> shift in single-layer graphene field-effect transistors and its correlation with raman inspection | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1109/TDMR.2012.2190414 | - |
dc.identifier.scopus | eid_2-s2.0-84862016676 | - |
dc.identifier.volume | 12 | - |
dc.identifier.issue | 2 | - |
dc.identifier.spage | 478 | - |
dc.identifier.epage | 481 | - |
dc.identifier.eissn | 1558-2574 | - |
dc.identifier.isi | WOS:000305085100038 | - |
dc.identifier.issnl | 1530-4388 | - |