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Article: Electrothermal simulation and thermal performance study of GaN vertical and lateral power transistors

TitleElectrothermal simulation and thermal performance study of GaN vertical and lateral power transistors
Authors
KeywordsElectrothermal simulation
GaN high-electron-mobility transistor (HEMT)
GaN metal-oxide-semiconductor field-effect transistor (MOSFET)
power electronics
thermal performance
Issue Date2013
Citation
IEEE Transactions on Electron Devices, 2013, v. 60, n. 7, p. 2224-2230 How to Cite?
AbstractIn this paper, we present self-consistent electrothermal simulations of single-finger and multifinger GaN vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) and lateral AlGaN/GaN high-electron-mobility transistors (HEMTs) and compare their thermal performance. The models are first validated by comparison with experimental dc characteristics, and then used to study the maximum achievable power density of the device without the peak temperature exceeding a safe operation limit of 150°C (P150°C). It is found that the vertical MOSFETs have the potential to achieve a higher P150° C than the lateral HEMTs, especially for higher breakdown voltages and higher scaling level designs. © 1963-2012 IEEE.
Persistent Identifierhttp://hdl.handle.net/10722/352117
ISSN
2023 Impact Factor: 2.9
2023 SCImago Journal Rankings: 0.785

 

DC FieldValueLanguage
dc.contributor.authorZhang, Yuhao-
dc.contributor.authorSun, Min-
dc.contributor.authorLiu, Zhihong-
dc.contributor.authorPiedra, Daniel-
dc.contributor.authorLee, Hyung Seok-
dc.contributor.authorGao, Feng-
dc.contributor.authorFujishima, Tatsuya-
dc.contributor.authorPalacios, Tomas-
dc.date.accessioned2024-12-16T03:56:48Z-
dc.date.available2024-12-16T03:56:48Z-
dc.date.issued2013-
dc.identifier.citationIEEE Transactions on Electron Devices, 2013, v. 60, n. 7, p. 2224-2230-
dc.identifier.issn0018-9383-
dc.identifier.urihttp://hdl.handle.net/10722/352117-
dc.description.abstractIn this paper, we present self-consistent electrothermal simulations of single-finger and multifinger GaN vertical metal-oxide-semiconductor field-effect transistors (MOSFETs) and lateral AlGaN/GaN high-electron-mobility transistors (HEMTs) and compare their thermal performance. The models are first validated by comparison with experimental dc characteristics, and then used to study the maximum achievable power density of the device without the peak temperature exceeding a safe operation limit of 150°C (P150°C). It is found that the vertical MOSFETs have the potential to achieve a higher P150° C than the lateral HEMTs, especially for higher breakdown voltages and higher scaling level designs. © 1963-2012 IEEE.-
dc.languageeng-
dc.relation.ispartofIEEE Transactions on Electron Devices-
dc.subjectElectrothermal simulation-
dc.subjectGaN high-electron-mobility transistor (HEMT)-
dc.subjectGaN metal-oxide-semiconductor field-effect transistor (MOSFET)-
dc.subjectpower electronics-
dc.subjectthermal performance-
dc.titleElectrothermal simulation and thermal performance study of GaN vertical and lateral power transistors-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/TED.2013.2261072-
dc.identifier.scopuseid_2-s2.0-84879903031-
dc.identifier.volume60-
dc.identifier.issue7-
dc.identifier.spage2224-
dc.identifier.epage2230-

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