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- Publisher Website: 10.1109/IEDM.2017.8268357
- Scopus: eid_2-s2.0-85045189076
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Conference Paper: 1200 V GaN vertical fin power field-effect transistors
| Title | 1200 V GaN vertical fin power field-effect transistors |
|---|---|
| Authors | |
| Issue Date | 2018 |
| Citation | Technical Digest - International Electron Devices Meeting, IEDM, 2018, p. 9.2.1-9.2.4 How to Cite? |
| Abstract | We demonstrate record performance in a novel normally-off GaN vertical transistor with submicron finshaped channels. This vertical fin transistor only needs n-GaN layers, with no requirement for epitaxial regrowth or p-GaN layers. A specific on-resistance of 0.2 mΩcm2 and a breakdown voltage over 1200 V have been demonstrated with extremely high ON current (over 25 kA/cm2) and low OFF current at 1200 V (below 10-4 A/cm2), rendering an excellent Baliga's figure of merit up to 7.2 GW/cm2. A threshold voltage of 1 V was achieved and was stable up to 150 °C. Large devices with high current up to 10 A and breakdown voltage over 800 V were also demonstrated. These results show the great potential of GaN vertical fin transistors for high-current and high-voltage power applications. |
| Persistent Identifier | http://hdl.handle.net/10722/352165 |
| ISSN | 2023 SCImago Journal Rankings: 1.047 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Zhang, Y. | - |
| dc.contributor.author | Sun, M. | - |
| dc.contributor.author | Piedra, D. | - |
| dc.contributor.author | Hu, J. | - |
| dc.contributor.author | Liu, Z. | - |
| dc.contributor.author | Lin, Y. | - |
| dc.contributor.author | Gao, X. | - |
| dc.contributor.author | Shepard, K. | - |
| dc.contributor.author | Palacios, T. | - |
| dc.date.accessioned | 2024-12-16T03:57:05Z | - |
| dc.date.available | 2024-12-16T03:57:05Z | - |
| dc.date.issued | 2018 | - |
| dc.identifier.citation | Technical Digest - International Electron Devices Meeting, IEDM, 2018, p. 9.2.1-9.2.4 | - |
| dc.identifier.issn | 0163-1918 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/352165 | - |
| dc.description.abstract | We demonstrate record performance in a novel normally-off GaN vertical transistor with submicron finshaped channels. This vertical fin transistor only needs n-GaN layers, with no requirement for epitaxial regrowth or p-GaN layers. A specific on-resistance of 0.2 mΩcm2 and a breakdown voltage over 1200 V have been demonstrated with extremely high ON current (over 25 kA/cm2) and low OFF current at 1200 V (below 10-4 A/cm2), rendering an excellent Baliga's figure of merit up to 7.2 GW/cm2. A threshold voltage of 1 V was achieved and was stable up to 150 °C. Large devices with high current up to 10 A and breakdown voltage over 800 V were also demonstrated. These results show the great potential of GaN vertical fin transistors for high-current and high-voltage power applications. | - |
| dc.language | eng | - |
| dc.relation.ispartof | Technical Digest - International Electron Devices Meeting, IEDM | - |
| dc.title | 1200 V GaN vertical fin power field-effect transistors | - |
| dc.type | Conference_Paper | - |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.doi | 10.1109/IEDM.2017.8268357 | - |
| dc.identifier.scopus | eid_2-s2.0-85045189076 | - |
| dc.identifier.spage | 9.2.1 | - |
| dc.identifier.epage | 9.2.4 | - |
