Correlation between hot-carrier-induced interface states and GIDL current increase in N-MOSFET's

Abstract

Correlation between created interface states and GIDL current increase in n-MOSFET's during hot-carrier stress is quantitatively discussed. A trap-assisted two-step tunneling model is used to relate the increased interface-state density (ADH) with the shift in GIDL current (ΔI d). Results show that under appropriate drain-gate biases, the two-step tunneling is so dominant that A/d is insensitive to temperatures up to about 50 °C. With the help of 2-D device simulation, the locations of the drain region with significant two-step tunneling and the energy levels of the traps involved can be found, with both depending on the drain voltage. From these insights on ADit,A/d and their relation, A Du near the midgap can be estimated, with an error less than 10% as compared to the results of chargepumping measurement on the same transistors. Devices with nitrided gate oxide, different gate-oxide thicknesses and different channel dimensions are also tested to verify the above correlation. © 1998 IEEE.