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- PMID: 19654627
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Article: Computation lithography: Virtual reality and virtual virtuality
Title | Computation lithography: Virtual reality and virtual virtuality |
---|---|
Authors | |
Keywords | Photolithography Microlithography Computational imaging |
Issue Date | 2009 |
Publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org |
Citation | Optics Express, 2009, v. 17 n. 15, p. 12259-12268 How to Cite? |
Abstract | Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America. |
Persistent Identifier | http://hdl.handle.net/10722/62090 |
ISSN | 2023 Impact Factor: 3.2 2023 SCImago Journal Rankings: 0.998 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lam, EY | en_HK |
dc.contributor.author | Wong, AKK | en_HK |
dc.date.accessioned | 2010-07-13T03:53:41Z | - |
dc.date.available | 2010-07-13T03:53:41Z | - |
dc.date.issued | 2009 | en_HK |
dc.identifier.citation | Optics Express, 2009, v. 17 n. 15, p. 12259-12268 | en_HK |
dc.identifier.issn | 1094-4087 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/62090 | - |
dc.description.abstract | Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America. | en_HK |
dc.language | eng | en_HK |
dc.publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org | en_HK |
dc.relation.ispartof | Optics Express | en_HK |
dc.rights | Optics Express. Copyright © Optical Society of America. | - |
dc.rights | This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/abstract.cfm?uri=oe-17-15-12259. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. | - |
dc.subject | Photolithography | - |
dc.subject | Microlithography | - |
dc.subject | Computational imaging | - |
dc.subject.mesh | Algorithms | en_HK |
dc.subject.mesh | Computer Simulation | en_HK |
dc.subject.mesh | Equipment Design | en_HK |
dc.subject.mesh | Models, Statistical | en_HK |
dc.subject.mesh | Models, Theoretical | en_HK |
dc.subject.mesh | Optics and Photonics | en_HK |
dc.subject.mesh | Physics - methods | en_HK |
dc.title | Computation lithography: Virtual reality and virtual virtuality | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1094-4087&volume=17&issue=15&spage=12259–12268&epage=&date=2009&atitle=Computation+lithography:+virtual+reality+and+virtual+virtuality | - |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_HK |
dc.identifier.authority | Lam, EY=rp00131 | en_HK |
dc.description.nature | postprint | - |
dc.identifier.doi | 10.1364/OE.17.012259 | en_HK |
dc.identifier.pmid | 19654627 | - |
dc.identifier.scopus | eid_2-s2.0-67749116249 | en_HK |
dc.identifier.hkuros | 171659 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-67749116249&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 17 | en_HK |
dc.identifier.issue | 15 | en_HK |
dc.identifier.spage | 12259 | en_HK |
dc.identifier.epage | 12268 | en_HK |
dc.identifier.isi | WOS:000268399500006 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_HK |
dc.identifier.scopusauthorid | Wong, AKK=7403147663 | en_HK |
dc.identifier.citeulike | 9791778 | - |
dc.identifier.issnl | 1094-4087 | - |