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Article: Enhanced hydrogen-sensing characteristics of MISiC Schottky-diode hydrogen sensor by trichloroethylene oxidation
Title | Enhanced hydrogen-sensing characteristics of MISiC Schottky-diode hydrogen sensor by trichloroethylene oxidation |
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Authors | |
Keywords | Hydrogen sensors NO Silicon carbide Trichloroethylene |
Issue Date | 2005 |
Publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/sna |
Citation | Sensors And Actuators, A: Physical, 2005, v. 119 n. 1, p. 63-67 How to Cite? |
Abstract | A novel metal-insulator-SiC (MISiC) Schottky-diode hydrogen sensor with the interfacial insulator layer grown in oxygen and trichloroethylene (TCE) is fabricated. The sensitivity and response speed of the device are investigated at different temperatures and hydrogen concentrations. The sensor can quickly respond to hydrogen variation and can give significant response even at a low hydrogen concentration of 48 ppm e.g., a sensitivity of 82% is achieved at 150 °C and 1 V. As compared to another sensor with the insulator grown in NO gas and the control without the insulator, the proposed sensor displays higher sensitivity and faster response. These improvements can be related to the effects of TCE on the quality and growth rate of the insulator layer. © 2004 Elsevier B.V. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/73783 |
ISSN | 2023 Impact Factor: 4.1 2023 SCImago Journal Rankings: 0.788 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Tang, WM | en_HK |
dc.contributor.author | Lai, PT | en_HK |
dc.contributor.author | Xu, JP | en_HK |
dc.contributor.author | Chan, CL | en_HK |
dc.date.accessioned | 2010-09-06T06:54:43Z | - |
dc.date.available | 2010-09-06T06:54:43Z | - |
dc.date.issued | 2005 | en_HK |
dc.identifier.citation | Sensors And Actuators, A: Physical, 2005, v. 119 n. 1, p. 63-67 | en_HK |
dc.identifier.issn | 0924-4247 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/73783 | - |
dc.description.abstract | A novel metal-insulator-SiC (MISiC) Schottky-diode hydrogen sensor with the interfacial insulator layer grown in oxygen and trichloroethylene (TCE) is fabricated. The sensitivity and response speed of the device are investigated at different temperatures and hydrogen concentrations. The sensor can quickly respond to hydrogen variation and can give significant response even at a low hydrogen concentration of 48 ppm e.g., a sensitivity of 82% is achieved at 150 °C and 1 V. As compared to another sensor with the insulator grown in NO gas and the control without the insulator, the proposed sensor displays higher sensitivity and faster response. These improvements can be related to the effects of TCE on the quality and growth rate of the insulator layer. © 2004 Elsevier B.V. All rights reserved. | en_HK |
dc.language | eng | en_HK |
dc.publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/sna | en_HK |
dc.relation.ispartof | Sensors and Actuators, A: Physical | en_HK |
dc.subject | Hydrogen sensors | en_HK |
dc.subject | NO | en_HK |
dc.subject | Silicon carbide | en_HK |
dc.subject | Trichloroethylene | en_HK |
dc.title | Enhanced hydrogen-sensing characteristics of MISiC Schottky-diode hydrogen sensor by trichloroethylene oxidation | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0924-4247&volume=119&spage=63&epage=67&date=2005&atitle=Enhanced+Hydrogen-Sensing+Characteristics+of+MISiC+Schottky-Diode+Hydrogen+Sensor+by+Trichloroethylene+Oxidation | en_HK |
dc.identifier.email | Lai, PT:laip@eee.hku.hk | en_HK |
dc.identifier.authority | Lai, PT=rp00130 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.sna.2004.08.032 | en_HK |
dc.identifier.scopus | eid_2-s2.0-17244367639 | en_HK |
dc.identifier.hkuros | 103249 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-17244367639&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 119 | en_HK |
dc.identifier.issue | 1 | en_HK |
dc.identifier.spage | 63 | en_HK |
dc.identifier.epage | 67 | en_HK |
dc.identifier.isi | WOS:000228309600008 | - |
dc.publisher.place | Switzerland | en_HK |
dc.identifier.scopusauthorid | Tang, WM=24438163600 | en_HK |
dc.identifier.scopusauthorid | Lai, PT=7202946460 | en_HK |
dc.identifier.scopusauthorid | Xu, JP=7408556215 | en_HK |
dc.identifier.scopusauthorid | Chan, CL=8507083700 | en_HK |
dc.identifier.issnl | 0924-4247 | - |