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- Publisher Website: 10.1109/EDSSC.2005.1635376
- Scopus: eid_2-s2.0-43549104278
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Conference Paper: Effects of gate-insulator nitridation gas on MISiC Schottky-diode hydrogen sensors
Title | Effects of gate-insulator nitridation gas on MISiC Schottky-diode hydrogen sensors |
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Authors | |
Issue Date | 2006 |
Citation | 2005 Ieee Conference On Electron Devices And Solid-State Circuits, Edssc, 2006, p. 717-720 How to Cite? |
Abstract | MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (NO, N 2O and NH 3) are fabricated. Steady-state and transient-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. The study also finds that N 2O provides the fastest insulator growth with good insulator quality, and hence the highest sensitivity among the three nitrided samples. The N 2O-nitrided sensor can give significant response even at a low H 2 concentration of 48-ppm H 2 in N 2, indicating potential applications for detecting hydrogen leakage at high temperature. The response times of the three nitrided samples are also shorter than that of the control sample. At 300 °C, the response time of the N 2O-nitrided sample to 48-ppm H 2 in N 2 is 11 s, while that of the control sample is 65 s. © 2005 IEEE. |
Persistent Identifier | http://hdl.handle.net/10722/99466 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Tang, WM | en_HK |
dc.contributor.author | Leung, CH | en_HK |
dc.contributor.author | Lai, PT | en_HK |
dc.contributor.author | Xu, JP | en_HK |
dc.date.accessioned | 2010-09-25T18:31:28Z | - |
dc.date.available | 2010-09-25T18:31:28Z | - |
dc.date.issued | 2006 | en_HK |
dc.identifier.citation | 2005 Ieee Conference On Electron Devices And Solid-State Circuits, Edssc, 2006, p. 717-720 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/99466 | - |
dc.description.abstract | MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (NO, N 2O and NH 3) are fabricated. Steady-state and transient-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. The study also finds that N 2O provides the fastest insulator growth with good insulator quality, and hence the highest sensitivity among the three nitrided samples. The N 2O-nitrided sensor can give significant response even at a low H 2 concentration of 48-ppm H 2 in N 2, indicating potential applications for detecting hydrogen leakage at high temperature. The response times of the three nitrided samples are also shorter than that of the control sample. At 300 °C, the response time of the N 2O-nitrided sample to 48-ppm H 2 in N 2 is 11 s, while that of the control sample is 65 s. © 2005 IEEE. | en_HK |
dc.language | eng | en_HK |
dc.relation.ispartof | 2005 IEEE Conference on Electron Devices and Solid-State Circuits, EDSSC | en_HK |
dc.title | Effects of gate-insulator nitridation gas on MISiC Schottky-diode hydrogen sensors | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Leung, CH:chleung@eee.hku.hk | en_HK |
dc.identifier.email | Lai, PT:laip@eee.hku.hk | en_HK |
dc.identifier.authority | Leung, CH=rp00146 | en_HK |
dc.identifier.authority | Lai, PT=rp00130 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1109/EDSSC.2005.1635376 | en_HK |
dc.identifier.scopus | eid_2-s2.0-43549104278 | en_HK |
dc.identifier.hkuros | 120799 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-43549104278&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.spage | 717 | en_HK |
dc.identifier.epage | 720 | en_HK |
dc.identifier.scopusauthorid | Tang, WM=24438163600 | en_HK |
dc.identifier.scopusauthorid | Leung, CH=7402612415 | en_HK |
dc.identifier.scopusauthorid | Lai, PT=7202946460 | en_HK |
dc.identifier.scopusauthorid | Xu, JP=35754128700 | en_HK |