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Article: Nebulous hotspot and algorithm variability in computation lithography
Title | Nebulous hotspot and algorithm variability in computation lithography | ||||||
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Authors | |||||||
Keywords | Algorithm variability Computational lithography Hotspot Lithography process check | ||||||
Issue Date | 2010 | ||||||
Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xml | ||||||
Citation | Journal of Micro/Nanolithography, Mems, and Moems, 2010, v. 9 n. 3 How to Cite? | ||||||
Abstract | Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2010 Society of Photo-Optical Instrumentation Engineers. | ||||||
Persistent Identifier | http://hdl.handle.net/10722/135094 | ||||||
ISSN | 2023 Impact Factor: 1.5 2023 SCImago Journal Rankings: 0.393 | ||||||
ISI Accession Number ID |
Funding Information: The authors express their sincere gratitude to Dr. Burn Lin and Dr. Ru-Gun Liu for their editorship of the present manuscript, and to Dr. C.-M. Lai for helpful comments on the simulation. The work described in this paper and its earlier conference version20 was partially supported by a grant from the Research Grants Council of the Hong Kong Special Administrative Region, China (project number 713408), and by the University Research Committee of the University of Hong Kong (project number 10400898). | ||||||
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lam, EY | en_HK |
dc.contributor.author | Wong, AK | en_HK |
dc.date.accessioned | 2011-07-27T01:28:17Z | - |
dc.date.available | 2011-07-27T01:28:17Z | - |
dc.date.issued | 2010 | en_HK |
dc.identifier.citation | Journal of Micro/Nanolithography, Mems, and Moems, 2010, v. 9 n. 3 | en_HK |
dc.identifier.issn | 1932-5150 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/135094 | - |
dc.description.abstract | Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2010 Society of Photo-Optical Instrumentation Engineers. | en_HK |
dc.language | eng | en_US |
dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xml | en_HK |
dc.relation.ispartof | Journal of Micro/Nanolithography, MEMS, and MOEMS | en_HK |
dc.rights | Copyright 2010 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/1.3459937 | - |
dc.subject | Algorithm variability | en_HK |
dc.subject | Computational lithography | en_HK |
dc.subject | Hotspot | en_HK |
dc.subject | Lithography process check | en_HK |
dc.title | Nebulous hotspot and algorithm variability in computation lithography | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_HK |
dc.identifier.authority | Lam, EY=rp00131 | en_HK |
dc.description.nature | published_or_final_version | - |
dc.identifier.doi | 10.1117/1.3459937 | en_HK |
dc.identifier.scopus | eid_2-s2.0-79952608321 | en_HK |
dc.identifier.hkuros | 186761 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-79952608321&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 9 | en_HK |
dc.identifier.issue | 3 | en_HK |
dc.identifier.spage | 033002-1 | - |
dc.identifier.epage | 033002-9 | - |
dc.identifier.isi | WOS:000282371200014 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_HK |
dc.identifier.scopusauthorid | Wong, AK=7403147663 | en_HK |
dc.identifier.issnl | 1932-5150 | - |