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Article: Nebulous hotspot and algorithm variability in computation lithography

TitleNebulous hotspot and algorithm variability in computation lithography
Authors
Lam, EYWong, AK
KeywordsAlgorithm variability
Computational lithography
Hotspot
Lithography process check
Issue Date2010
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xml
Citation
Journal of Micro/Nanolithography, Mems, and Moems, 2010, v. 9 n. 3 How to Cite?
DOI: http://dx.doi.org/10.1117/1.3459937
AbstractComputation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2010 Society of Photo-Optical Instrumentation Engineers.
Persistent Identifierhttp://hdl.handle.net/10722/135094
ISSN
1932-5150
2021 Impact Factor: 1.167
2020 SCImago Journal Rankings: 0.394
ISI Accession Number ID
WOS:000282371200014
Funding AgencyGrant Number
Research Grants Council of the Hong Kong Special Administrative Region, China713408
University Research Committee of the University of Hong Kong10400898
Funding Information:

The authors express their sincere gratitude to Dr. Burn Lin and Dr. Ru-Gun Liu for their editorship of the present manuscript, and to Dr. C.-M. Lai for helpful comments on the simulation. The work described in this paper and its earlier conference version20 was partially supported by a grant from the Research Grants Council of the Hong Kong Special Administrative Region, China (project number 713408), and by the University Research Committee of the University of Hong Kong (project number 10400898).

References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorLam, EYen_HK
dc.contributor.authorWong, AKen_HK
dc.date.accessioned2011-07-27T01:28:17Z-
dc.date.available2011-07-27T01:28:17Z-
dc.date.issued2010en_HK
dc.identifier.citationJournal of Micro/Nanolithography, Mems, and Moems, 2010, v. 9 n. 3en_HK
dc.identifier.issn1932-5150en_HK
dc.identifier.urihttp://hdl.handle.net/10722/135094-
dc.description.abstractComputation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2010 Society of Photo-Optical Instrumentation Engineers.en_HK
dc.languageengen_US
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x865.xmlen_HK
dc.relation.ispartofJournal of Micro/Nanolithography, MEMS, and MOEMSen_HK
dc.rightsCopyright 2010 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/1.3459937-
dc.subjectAlgorithm variabilityen_HK
dc.subjectComputational lithographyen_HK
dc.subjectHotspoten_HK
dc.subjectLithography process checken_HK
dc.titleNebulous hotspot and algorithm variability in computation lithographyen_HK
dc.typeArticleen_HK
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1117/1.3459937en_HK
dc.identifier.scopuseid_2-s2.0-79952608321en_HK
dc.identifier.hkuros186761en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-79952608321&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume9en_HK
dc.identifier.issue3en_HK
dc.identifier.spage033002-1-
dc.identifier.epage033002-9-
dc.identifier.isiWOS:000282371200014-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK
dc.identifier.scopusauthoridWong, AK=7403147663en_HK
dc.identifier.issnl1932-5150-

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